Noble gas retention in the target during rotating cylindrical magnetron sputtering

Mahieu, Stijn; Leroy, Wouter; Depla, Diederik; Schreiber, S.; Möller, W.

doi:10.1063/1.2970037

Cited by 13 publications

(7 citation statements)

References 17 publications

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“…13. Figure 2 shows the measured and simulated energy distribution of Y particles sputtered from a planar target in a pure Ar gas at 0.4 Pa and a target-substrate distance of 8 cm.…”

Section: Simulation Of the Transport Through The Gas Phasementioning

confidence: 99%

Modeling the flux of high energy negative ions during reactive magnetron sputtering

Mahieu

Leroy

Aeken

et al. 2009

Journal of Applied Physics

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Articles you may be interested inInvestigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges J. Appl. Phys. 115, 153301 (2014); 10.1063/1.4871635 Current-voltage-time characteristics of the reactive Ar/O2 high power impulse magnetron sputtering dischargeThe negative ion flux during reactive sputtering from planar and rotating cylindrical magnetrons has been studied. Energy resolved mass spectrometry was used to measure the energy and mass distribution of the negative ions. Also the angular distribution of the high energy ions was characterized for planar as well as for rotating cylindrical magnetrons. Besides these measurements, a binary collision Monte Carlo simulation code, SiMTRA, was adapted in order to simulate the energy, mass, and angular distribution of the high energy negative ions. All simulated distributions, for both planar and rotating cylindrical magnetrons, were in excellent correspondence with the experimental observations. Also a model for the amount of high energy negative O − ions was proposed. Indeed, the logarithm of the amount of high energy negative O − ions is shown to be related to the secondary electron emission yield of the oxide target, and these two parameters are known to be related to the work function. The SiMTRA simulations, in combination with knowledge of the work function or secondary electron emission yield of the target, allow modeling the flux of high energy negative ions during reactive magnetron sputtering.

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“…13. Figure 2 shows the measured and simulated energy distribution of Y particles sputtered from a planar target in a pure Ar gas at 0.4 Pa and a target-substrate distance of 8 cm.…”

Section: Simulation Of the Transport Through The Gas Phasementioning

confidence: 99%

Modeling the flux of high energy negative ions during reactive magnetron sputtering

Mahieu

Leroy

Aeken

et al. 2009

Journal of Applied Physics

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“…5 Some trapped noble gas atoms could be collisionally mobilized close to the surface and receive additional kinetic energy when being pushed out from the lattice. 5 In this sense, sputtered noble gas atoms can be treated like sputtered target atoms but with their different mass. The appearance of atoms with different velocities smears out the timing when neutrals become available for ionization after ion evacuation.…”

Section: André Anders A)mentioning

confidence: 99%

“…It also applies if the erosion zone is smeared out, i.e., in the case of magnetrons with rotating targets or rotating magnets. 4,5 At high power, the magnetron discharge has the capability for self-sputtering and ionization runway. 6,7 The presence of noble gas such as argon can lead to an additional plasma density enhancement through a "gas recycling" loop in front of the target in analogy to a self-sputtering / ionization loop.…”

Section: André Anders A)mentioning

confidence: 99%

Self-organization and self-limitation in high power impulse magnetron sputtering

Anders

2012

Applied Physics Letters

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The plasma over the racetrack in high power impulse magnetron sputtering develops in traveling ionization zones. Power densities can locally reach 109 W/m2, which is much higher than usually reported. Ionization zones move because ions are “evacuated” by the electric field, exposing neutrals to magnetically confined, drifting electrons. Drifting secondary electrons amplify ionization of the same ionization zone where the primary ions came from, while sputtered and outgassing atoms are supplied to the following zone(s). Strong density gradients parallel to the target disrupt electron confinement: a negative feedback mechanism that stabilizes ionization runaway.

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“…Furthermore, rotating cylindrical magnetrons have proven their worth in research, as to exhibit certain fundamental effects in the magnetron sputtering process (e.g. the influence of redeposition on the behavior in reactive sputtering), which would not have been possible for a planar magnetron [4][5][6].…”

Section: Introductionmentioning

confidence: 99%

Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere

Leroy¹,

Konstantinidis²,

Mahieu³

et al. 2011

J. Phys. D: Appl. Phys.

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To cite this version:W P Leroy, S Konstantinidis, S Mahieu, R Snyders, D Depla. Angular-resolved energy flux measurements of a dc-and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere. Journal of Physics D: Applied Physics, IOP Publishing, 2011, 44 (11) A rotating cylindrical magnetron equipped with a titanium target, was sputtered in DC and in HIPIMS mode, both in metallic and in oxide regime. For all sputter modes, the same process conditions and the same average sputtering power of 300W were used. An angular-resolved study was performed, 90 degrees around the rotating cylindrical magnetron, which obtained the total energy flux arriving at the substrate. Furthermore, the energy flux per adparticle was calculated by measuring the deposition rate for all sputter modes and regimes. There is only a small difference in total arriving energy flux between the DC-mode and the HIPIMS mode. A maximum arriving energy flux of ca. 0.26 mW/cm 2 was measured, when normalized to the sputtering power. Concerning the deposition rate, up to a 75% decrease was found from DC to HIPIMS mode. Furthermore, the emission and the transport of the particles have a similar angular profile for all sputter modes. Among the HIPIMS modes, a decrease in deposition rate was measured with increasing pulse length. Therefore, the energy which arrives per adparticle is the highest for the HIPIMS modes. A difference in the angular shape of the energy per arriving adparticle is noticed between the DC and the HIPIMS modes. The DC mode has a maximum arriving energy per adparticle around 50 degrees, while this is at 60 degrees for the HIPIMS mode.

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Noble gas retention in the target during rotating cylindrical magnetron sputtering

Cited by 13 publications

References 17 publications

Modeling the flux of high energy negative ions during reactive magnetron sputtering

Modeling the flux of high energy negative ions during reactive magnetron sputtering

Self-organization and self-limitation in high power impulse magnetron sputtering

Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere

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