The
current synthesis methods of high-entropy alloy (HEA) thin-film
coatings face huge challenges in facile preparation, precise thickness
control, conformal integration, and affordability. These challenges
are more specific and noteworthy for noble metal-based HEA thin films
where the conventional sputtering methods encounter thickness control
and high-cost issues (high-purity noble metal targets required). Herein,
for the first time, we report a facile and controllable synthesis
process of quinary HEA coatings consisting of noble metals (Rh, Ru,
Pt, Pd, and Ir), by sequential atomic layer deposition (ALD) coupled
with electrical Joule heating for post-alloying. Furthermore, the
resulting quinary HEA thin film with a thickness of ∼50 nm
and an atomic ratio of 20:15:21:18:27 shows promising potential as
a platform for catalysis, exhibiting enhanced electrocatalytic hydrogen
evolution reaction (HER) performances with lower overpotentials (e.g.,
from 85 to 58 mV in 0.5 M H2SO4) and higher
stability (by retaining more than 92% of the initial current after
20 h with a current density of 10 mA/cm2 in 0.5 M H2SO4) than other noble metal-based structure counterparts
in this work. The enhanced material properties and device performances
are attributed to the efficient electron transfer of HEA with the
increased number of active sites. This work not only presents RhRuPtPdIr
HEA thin films as promising HER catalysts but also sheds light on
controllable fabrication of conformal HEA-coated complex structures
toward a broad range of applications.