2022
DOI: 10.1038/s41598-022-06595-9
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Noble metal alloy thin films by atomic layer deposition and rapid Joule heating

Abstract: Metal alloys are usually fabricated by melting constituent metals together or sintering metal alloy particles made by high energy ball milling (mechanical alloying). All these methods only allow for bulk alloys to be formed. This manuscript details a new method of fabricating Rhodium–Iridium (Rh–Ir) metal alloy films using atomic layer deposition (ALD) and rapid Joule heating induced alloying that gives functional thin film alloys, enabling conformal thin films with high aspect ratios on 3D nanostructured subs… Show more

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Cited by 19 publications
(14 citation statements)
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References 46 publications
(48 reference statements)
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“…First, a two-step approach consisting of sequential ALD and EJH was introduced to fabricate RhRuPtPdIr HEA thin films. , As shown in Figure a, ALD with precise thickness control was first introduced to sequentially deposit the individual layers of Rh, Ru, Pt, Pd, and Ir with a uniform thickness of ∼10 nm each, onto the glassy carbon electrode (GCE) substrate. After ALD growth, the as-deposited Rh/Ru/Pt/Pd/Ir 5-layer underwent EJH at 1000 °C for 1–5 s under low vacuum conditions to induce interdiffusion of various metal atoms in the out-of-plane direction (i.e., along the film thickness) to obtain the HEA thin film.…”
Section: Results and Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…First, a two-step approach consisting of sequential ALD and EJH was introduced to fabricate RhRuPtPdIr HEA thin films. , As shown in Figure a, ALD with precise thickness control was first introduced to sequentially deposit the individual layers of Rh, Ru, Pt, Pd, and Ir with a uniform thickness of ∼10 nm each, onto the glassy carbon electrode (GCE) substrate. After ALD growth, the as-deposited Rh/Ru/Pt/Pd/Ir 5-layer underwent EJH at 1000 °C for 1–5 s under low vacuum conditions to induce interdiffusion of various metal atoms in the out-of-plane direction (i.e., along the film thickness) to obtain the HEA thin film.…”
Section: Results and Discussionmentioning
confidence: 99%
“…The EJH annealing step was conducted with the setup and parameters following our previous work. , In short, the as-deposited Rh/Ru/Pt/Pd/Ir 5-layer thin films on GCE were placed on top of a commercial carbon felt (Fuel Cell Earth Inc.) under low vacuum conditions (<1 Torr). To conduct the EJH process, 3 s of temperature ramping at 10 5 K/s was applied first, and then the samples were annealed at a temperature of 1000 °C for 1, 3, and 5 s.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…[36][37][38] EJH of PtIrPd Thin Film: The custom-built electric Joule heating setup and heating parameters have been described elsewhere. [43,44] Briefly, as-deposited PtIrPd thin films on sapphire were placed on top of a carbon felt (Fuel Cell Earth) under mild vacuum conditions (<1 Torr). The alloy film samples were then heated at 785, 980, and 1145 °C, respectively, with a 3 s ramp dwell followed by an annealing dwell of 5 s.…”
Section: Methodsmentioning
confidence: 99%
“…[41] EJH is an ultrafast heating approach that promotes accelerated interatomic diffusion at high temperatures while kinetically inhibiting phase separation within the few-second-timescale process window. [42][43][44] Hence, we conducted the sequential ALD growth of metal components layerby-layer (i.e., Pt, Ir, and Pd), followed by the EJH post-treatment to obtain homogenous MEA thin films, as shown in Figure 1. PtIrPd MEA thin films with a thickness of %20 nm and an atomic ratio of 35:35:30 at 980 °C were obtained after 5 s EJH.…”
Section: Introductionmentioning
confidence: 99%
“…Similar works of Joule heating-induced sintering of metals, nitrides, oxides, and phosphates have been reported by other groups. [38][39][40][41][42][43] However, in all these studies, they did not involve polymer self-assembly, and the structure order and porosity characteristics have not been established at the nanoscale.…”
Section: Introductionmentioning
confidence: 99%