2015
DOI: 10.1063/1.4915322
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Noise coupling between through-silicon vias and active devices for 20/14-nm technology nodes

Abstract: Although a through-silicon via (TSV) is widely used in three-dimensional integrated circuit systems, one of its major design challenges is noise coupling between TSVs and active devices. This paper investigates noise coupling between TSVs and active devices for 20/14-nm technology nodes. The effect of variations of structural parameters on noise coupling was examined using a three-dimensional full-wave electromagnetic field solver and its result was explained. Additionally, transient analysis on coupling noise… Show more

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Cited by 5 publications
(3 citation statements)
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“…The separation of MEA and LED probes in space distance and heavily doped silicon substrate can significantly reduce crosstalk. According to published studies (Fang et al, 2015;Kim et al, 2020;Wang et al, 2021), there are two sources of noise: first, when the wireless energy supply system works, it will introduce electromagnetic interference by supplying power to the LED probe through electromagnetic induction; second, when the LED probe is turned on and illuminated on the silicon substrate, it will produce the photovoltaic effect. The MEA used in the experiment was prepared on a heavily doped silicon substrate, which suppressed noise to a large extent (Wei et al, 2020).…”
Section: Discussionmentioning
confidence: 99%
“…The separation of MEA and LED probes in space distance and heavily doped silicon substrate can significantly reduce crosstalk. According to published studies (Fang et al, 2015;Kim et al, 2020;Wang et al, 2021), there are two sources of noise: first, when the wireless energy supply system works, it will introduce electromagnetic interference by supplying power to the LED probe through electromagnetic induction; second, when the LED probe is turned on and illuminated on the silicon substrate, it will produce the photovoltaic effect. The MEA used in the experiment was prepared on a heavily doped silicon substrate, which suppressed noise to a large extent (Wei et al, 2020).…”
Section: Discussionmentioning
confidence: 99%
“…Today, due to the growing demand of users for devices with high processing speed, there is a need for technologies that can operate at high frequency. In other words, it is predicted that high clock speed will be needed in the future [10] . These technologies suffer from high leakage currents.…”
Section: Power Loss and Fabrication Technologiesmentioning
confidence: 99%
“…Therefore, the use of them leads to a dramatic increase in static power loss. Moreover, with the development of technology, the supply voltage has decreased [10] , but the threshold voltage has not changed much.…”
Section: Power Loss and Fabrication Technologiesmentioning
confidence: 99%