2022
DOI: 10.1063/5.0129509
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Non-linear etch process of MF particles embedded in an rf plasma with oxygen admixture

Abstract: Commonly used melamine formaldehyde micro-particles exposed to an rf discharge are known to be etched by a plasma as soon as an admixture of oxygen is present. By means of in situ high precision size measurements, the plasma–surface interaction is investigated. A comparison of experimental data, advanced Mie-scattering techniques, and a reaction rate model allows, for the first time, to quantitatively describe the etch process.

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Cited by 3 publications
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