1997
DOI: 10.1088/0268-1242/12/4/026
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Non-metalin situandex situohmic contacts to n-ZnSe

Abstract: The formation of ohmic contacts between indium tin oxide (ITO) and MBE-grown n-ZnSe layers has been investigated using x-ray photoelectron spectroscopy (XPS) and currrent voltage (I -V ) techniques. In contrast to metal-ZnSe contacts, ohmic behaviour is found for ITO contacts made in situ to as-grown n-ZnSe layers as well as contacts made ex situ to oxidized layers. It is possible to form ohmic contacts for ZnSe doping levels in the range of n = 2 × 10 17 to 8 × 10 18 cm −3 with contact resistances as low as R… Show more

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Cited by 4 publications
(2 citation statements)
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“…The 400-mmthick GaAs substrates are n-doped with Si concentrations of 3 3 10 16 cm 23 and back-contacted with indium. ZnSe epilayers, grown on the substrates by molecular beam epitaxy, are n-doped with Cl donors and transparently contacted by 40 nm of indium tin oxide 11 . The epilayers are 100, 150, 200 and 300 nm thick and have a carrier density of 5±15 3 10 17 cm 23 ; for brevity, only results from two extreme samples (100 nm thick, n 5 3 10 17 cm 23 and 300 nm thick, n 15 3 10 17 cm 23 ) will be presented.…”
mentioning
confidence: 99%
“…The 400-mmthick GaAs substrates are n-doped with Si concentrations of 3 3 10 16 cm 23 and back-contacted with indium. ZnSe epilayers, grown on the substrates by molecular beam epitaxy, are n-doped with Cl donors and transparently contacted by 40 nm of indium tin oxide 11 . The epilayers are 100, 150, 200 and 300 nm thick and have a carrier density of 5±15 3 10 17 cm 23 ; for brevity, only results from two extreme samples (100 nm thick, n 5 3 10 17 cm 23 and 300 nm thick, n 15 3 10 17 cm 23 ) will be presented.…”
mentioning
confidence: 99%
“…In case of all ex situ techniques, contacts at the metal-ZnSe interface are hampered by the formation of a native oxide. X-ray photoelectron spectroscopy studies performed in ref identified this native oxide as a thin SeO 2 layer on top of the ZnSe surface. So far in the literature, the lowest ρ c was reported for a layer stack of Ti/Pt/Au contacts, for which the oxide was wet-chemically removed prior to metallization.…”
Section: Resultsmentioning
confidence: 97%