2015
DOI: 10.1016/j.carbon.2015.01.044
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Non-metal catalytic synthesis of graphene from a polythiophene monolayer on silicon dioxide

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Cited by 12 publications
(5 citation statements)
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“…Catalytic growth on the Cu surface relates to the synthesis of mono- to bilayer graphene, , while noncatalytic growth of graphene relates to a graphene growth reaction where carbon atoms exist between the Cu metal and the substrate. As noncatalytic growth of graphene using SAMs was reported earlier, the Cu metal acts not only as a catalyst for surface-mediated graphene growth but also as an encapsulation layer to prevent carbon out-diffusion. We believe that low carbon solubility of Cu may give rise to multilayer graphene growth.…”
Section: Resultsmentioning
confidence: 83%
“…Catalytic growth on the Cu surface relates to the synthesis of mono- to bilayer graphene, , while noncatalytic growth of graphene relates to a graphene growth reaction where carbon atoms exist between the Cu metal and the substrate. As noncatalytic growth of graphene using SAMs was reported earlier, the Cu metal acts not only as a catalyst for surface-mediated graphene growth but also as an encapsulation layer to prevent carbon out-diffusion. We believe that low carbon solubility of Cu may give rise to multilayer graphene growth.…”
Section: Resultsmentioning
confidence: 83%
“…After the addition of SAM, the silane undergoes reactions such as hydrolysis and dehydration condensation on the substrate. Then, a dense and ordered film is formed. The optical microscopy images of the samples are in Figure S1. The results of the water contact angle test with and without SAM on the substrate are shown in Figure b–d.…”
Section: Resultsmentioning
confidence: 99%
“…In these cases, metal residues always exist in the graphene grown by metal‐assisted approaches. Therefore, researchers have tried to develop various metal‐free growth approaches, including high temperature thermal CVD, [ 363 ] low‐pressure CVD, [ 364 ] pulsed laser deposition, [ 365 ] and SAM, [ 366 ] etc.…”
Section: Conclusion and Challengesmentioning
confidence: 99%