2005
DOI: 10.1007/s11244-005-7858-2
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Non-Stoichiometric Oxide Surfaces and Ultra-thin Films: Characterisation of TiO2

Abstract: Reducible transition metal oxides are key components in many catalytic, sensing and device systems however relatively little quantitative information exists on the nature of non-stoichiometric phases. In this study, we show how substrates can be prepared in a controlled manner with designed levels of non-stoichiometry. These in turn will facilitate quantitative studies of the interaction of non-stoichiometric oxide materials with adsorbates, reactants and supported metallic particles. We grow stoichiometric ul… Show more

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Cited by 22 publications
(31 citation statements)
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“…In this paper we detail the growth of electronic and vibrational properties of ultra-thin film TiO 2 (110) grown on W(100). The experimental data extends our previous study which concentrated on detailing the growth characterising the geometrical structure of thicker ultra-thin films (>2nm) [11,20]. That work showed by LEED (and some ex-situ STM) that the films grew epitaxially aligned in the (110) orientation, covered the surface and had step heights of 3.2Å as per rutile TiO 2 , making this system one of the best characterised TiO x films.…”
Section: Introductionsupporting
confidence: 80%
“…In this paper we detail the growth of electronic and vibrational properties of ultra-thin film TiO 2 (110) grown on W(100). The experimental data extends our previous study which concentrated on detailing the growth characterising the geometrical structure of thicker ultra-thin films (>2nm) [11,20]. That work showed by LEED (and some ex-situ STM) that the films grew epitaxially aligned in the (110) orientation, covered the surface and had step heights of 3.2Å as per rutile TiO 2 , making this system one of the best characterised TiO x films.…”
Section: Introductionsupporting
confidence: 80%
“…[19][20][21] Nevertheless, systematic studies of nonstoichiometric TiO 2 have been presented in which the stoichiometry has been changed through three routes: ͑i͒ Ar ion bombardment, 22 which preferentially sputters oxygen; ͑ii͒ oxygen desorption induced by electronic excitations ͑e.g., electron beam͒ and the Knotek-Feibelman mechanism; 23 and ͑iii͒ Ti deposition on a stoichiometric surface. 24 These studies show that reduced species appear in XPS as a clear shoulder on the notionally Ti 4+ bulk signal ͑chemical core level shift of Ti 2p states͒ 25 and in UPS as the appearance of a Ti 3d derived defect state in the band gap. 26 This state is found in the band gap, 0.9 eV below the Fermi level, 12,[14][15][16][17][18]26 and is attributed to formation of reduced Ti 3+ .…”
Section: Introductionmentioning
confidence: 94%
“…However, there has generally been no independent way of quantifying the level of nonstoichiometry. In a recent work nonstoichiometric TiO 2 was investigated by deposition of submonolayer neutral Ti atoms onto the surface, 25 enabling the measured nonstoichiometry to be directly compared to the amount of Ti added. The use of TiO 2 ultrathin films epitaxially grown on W͑100͒ enabled separation of bulk and surface effects.…”
Section: Introductionmentioning
confidence: 99%
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“…Surface defects such as oxygen vacancies can be easily created and are important for the surface chemistry and properties of TiO 2 [99,[142][143][144][145][146]. Oxygen vacancies are found to be color centers which respond to visible light irradiation [147][148][149][150].…”
Section: Defect Sites For Visible Light Photoresponsementioning
confidence: 99%