Waveplates, used to modify polarization state of light, are integral part of high‐power lasers. Classical approach to waveplate manufacturing is based on combination of birefringent crystalline materials and deposition of nonpolarizing antireflection (AR) coatings. Their limitation to withstand maximal peak power is determined by laser‐induced damage (LID) phenomena, mainly determined by low band‐gap materials used in AR coatings. In this study, a novel multi‐layer approach of high band‐gap birefringent coatings was proposed and investigated to overcome this limitation. Three eligible candidate materials, namely LaF3, Al2O3, and SiO2 are investigated. Structural and optical analysis reveal superior properties of silica for UV spectral range. Zero‐order thin film retarders based on all‐silica nano‐structures are fabricated by oblique angle deposition process. Low optical losses and high transparency (T ∼ 99%) are demonstrated while indicating potential to withstand high laser fluence of 40 J cm−2 in nanosecond regime at 355 nm wavelength. Such waveplates can essentially improve maximal tolerated peak power and thus allow production of more compact optical systems, even when high laser power is used.