2017
DOI: 10.1016/j.apsusc.2016.10.131
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Nonlinear ellipsometry of Si(111) by second harmonic generation

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Cited by 5 publications
(17 citation statements)
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“…In the experiment, the RA-SHG response of a Si(1 1 1) sample investigated with an incident radiation at a wavelength of 800 nm reflects the underlying bond symmetry. As seen in figure 10(a), the shape of the angular SHG response is six-fold for ps, ss and three-fold for pp, sp polarization combinations, and the pattern could succesfully be explained in the context of the SBHM introduced above, including only surface dipole contributions [82].…”
Section: Semiconductorsmentioning
confidence: 89%
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“…In the experiment, the RA-SHG response of a Si(1 1 1) sample investigated with an incident radiation at a wavelength of 800 nm reflects the underlying bond symmetry. As seen in figure 10(a), the shape of the angular SHG response is six-fold for ps, ss and three-fold for pp, sp polarization combinations, and the pattern could succesfully be explained in the context of the SBHM introduced above, including only surface dipole contributions [82].…”
Section: Semiconductorsmentioning
confidence: 89%
“…In this context, it was shown that the SHG response for the pp polarization combination is a result of interference between bulk and surface nonlinear contributions [83]. With the help of the SBHM, the different contributions originating from dipolar surface and quadrupolar bulk contributions could successfully be separated, also by evaluating measurements at arbitrary polarization orientations of the input raditation, exemplified for a fundamental wavelength of 890 nm in [82,84]. In figure 11, the RA-SHG response from Si(1 1 1) for the pp polarization combination is plotted, for the first time, for several different wavelengths of the fundamental radiation in the range between 750 nm and 1050 nm.…”
Section: Semiconductorsmentioning
confidence: 99%
“…At the SiO 2 /Si interface and defect sites, the dominant SHG source is the dipolar terms, which can be modeled in the SBHM via [ 17 , 32 , 33 , 34 ]: whereas the quadrupolar term that dominates in the bulk can written in the following form [ 33 , 35 ]: where and are the third and fourth rank susceptibility tensors, respectively; and are the E field of the incident wave and its gradient, respectively; is the volume; is the total number of bonds inside the considered unit cells; is the bond unit vector; is the dipolar SHG hyperpolarizability that corresponds to , and is the quadrupolar SHG hyperpolarizability that is consistent with all the bonds in the bulk term. The gradient of the E field along the direction of the incident wave, , takes the form where is a complex fitting number [ 24 , 25 ]. In the subsequent fitting, we adopted the value fitted out for the Si in the previous work [ 24 , 25 ].…”
Section: Theorymentioning
confidence: 99%
“…The gradient of the E field along the direction of the incident wave, , takes the form where is a complex fitting number [ 24 , 25 ]. In the subsequent fitting, we adopted the value fitted out for the Si in the previous work [ 24 , 25 ]. The E field of the incident wave is determined by the angle of incidence, , and the polarization, , (0 for s - and 90 for p -polarization), such that where is the field amplitude in the air, and and are the Fresnel transmission coefficients for the p - and s -polarization of the interfaces between the air and the SHG source, respectively.…”
Section: Theorymentioning
confidence: 99%
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