“…Nevertheless, these detailed models can be employed to derive low-order models that are practical for model-based control techniques (Gallivan and Murray, 2004;Raimondeau and Vlachos, 2000;Varshney and Armaou, 2008). In specific deposition processes, closed-form process models describing surface morphology of thin films can be developed in the form of stochastic PDEs (Hu et al, 2008;Lou and Christofides, 2006;Zhang et al, 2010). The construction and validation of the stochastic PDE models are conducted through a set of snapshots obtained from the KMC simulations that cover the complete operating region (Ni and Christofides, 2005).…”