We examined the effect of temperature and electric field on the activation energy (E a ) of gateinduced drain leakage (GIDL) of a MOSFET. The measured GIDL current shows a temperature dependence consistent with a non-tunneling mechanism. In the low-electric-field regime and for temperatures above 55 C, E a is about 0.4 eV and drops from 0.4 eV to 0.1 eV as the applied gate voltage goes below V FB in the accumulation direction (decreased for the n-channel MOSFET). This suggests that electron-hole-pair generation at Si/SiO 2 interface traps (D it ), enhanced by the electric field (the Poole-Frenkel effect), dominates GIDL in that regime. For temperatures below 55 C, E a is less than 0.15 eV for both weak and strong electric fields and displays minimal temperature dependence, indicating inelastic trap-assisted tunneling or phonon-assisted tunneling from a trap. In the very strong-electric-field regime (>1 MV/cm), band-to-band tunneling is the dominant mechanism. V C 2013 American Institute of Physics.