Nonpolarizing single layer inorganic and double layer organic-inorganic one-dimensional guided mode resonance filters

Saleem, Muhammad Rizwan; Honkanen, Seppo; Turunen, Jari

doi:10.1117/12.2001692

Cited by 5 publications

(1 citation statement)

References 11 publications

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“…There have been a variety of designs proposed to realize polarization-insensitive filters based on 1D GMRF for both normal and oblique incidences. Muhammad et al reported two types of non-polarizing resonant filters based on 1D GMRF with classic mounting under normal incidence [11], [12]. G. Niederer, D. Lacour and B. Xu et al designed and characterized a type of polarizationindependent resonant grating filter with full conical mounting under normal incidence, respectively [13]- [15].…”

Section: Introductionmentioning

confidence: 99%

Polarization-Independent Filter Based on 2-D Crossed Grating Under Oblique Incidence

Wang

Zhan

2018

IEEE Photonics J.

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The existing polarization-insensitive filters based on two dimensional (2-D) grating are mostly under normal incidence. However, in filtering optical devices, the normal incidence regime is usually avoided because it requires the use of beam separators which yields a loss of efficiency. Herein, we present a compact method to realize polarizationindependent filter under oblique incidence, which is implemented on 2-D crossed grating in the telecommunication region. Plane of incidence is set to be in xz plane and three different polarization angles (0°, 45°, and 90°) are used to demonstrate the polarization-insensitivity. Realization of the polarization-insensitivity of the 2-D filter is based on the split feature under oblique incidence, according to the analysis of the physical mechanism. The location of the polarization-independent resonance is mainly determined by the grating period along x-axis and will right shift with increasing the period. Results show that the polarization-insensitive resonances occur at 1356.9 nm, 1372.6 nm and 1398.5 nm when the grating periods along x-axis are 830 nm, 850 nm and 870 nm, respectively. Moreover, the results and methods provided herein can be applied to search for the polarization-insensitive resonances of the 2-D grating with other planes of incidence.

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Section: Introductionmentioning

confidence: 99%

Polarization-Independent Filter Based on 2-D Crossed Grating Under Oblique Incidence

Wang

Zhan

2018

IEEE Photonics J.

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Titanium dioxide thin films by atomic layer deposition: a review

Niemelä

Marín

Karppinen

2017

Semicond. Sci. Technol.

145

116

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Within its rich phase diagram titanium dioxide is a truly multifunctional material with a property palette that has been shown to span from dielectric to transparent-conducting characteristics, in addition to the well-known catalytic properties. At the same time down-scaling of microelectronic devices has led to an explosive growth in research on atomic layer deposition (ALD) of a wide variety of frontier thin-film materials, among which TiO2 is one of the most popular ones. In this topical review we summarize the advances in research of ALD of titanium dioxide starting from the chemistries of the over 50 different deposition routes developed for TiO2 and the resultant structural characteristics of the films. We then continue with the doped ALD-TiO2 thin films from the perspective of dielectric, transparent-conductor and photocatalytic applications. Moreover, in order to cov er the lat est tr ends in t he research f ield, both the var iously constr ucted TiO2 nanostructures enabled by ALD and the Ti-based hybrid inorganic-organic films grown by the emerging ALD/MLD (combined atomic/molecular layer deposition) technique are discussed.

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Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication

Staaks

Dhuey

et al. 2019

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Chromium and its oxides are valuable as functional materials and plasma-etching hard masks in micro- and nanofabrication. While the continuous decrease in feature sizes opens new opportunities for applications of patterned chromium, the demands placed on the patterning process require a new level of mechanistic understanding. In this work, we investigate plasma etching with chlorine/oxygen chemistry using temperature and oxygen concentration as a means to controllably pattern chromium at the nanometer level. Building on our previous studies on blanket film chromium etching, we look here at patterned trenches 15–100 nm wide in 20 and 10 nm thick chromium films. We vary oxygen concentrations from 1.5% to 81% at substrate temperatures of +20 and −50 °C, respectively. Feature and trench profiles are evaluated from high-resolution cross-sectional SEM images. The ternary chromium etch product shows very different profiles as oxygen, temperature, and feature size are varied. We find the highest anisotropy at −50 °C and 50% oxygen concentration. Etch results suggest that the redeposition of nonvolatile intermediate reaction compounds enhances anisotropy at low temperature, whereas re-emission of reactive species causes undercut at the higher etching temperature.

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Nonpolarizing single layer inorganic and double layer organic-inorganic one-dimensional guided mode resonance filters

Cited by 5 publications

References 11 publications

Polarization-Independent Filter Based on 2-D Crossed Grating Under Oblique Incidence

Polarization-Independent Filter Based on 2-D Crossed Grating Under Oblique Incidence

Titanium dioxide thin films by atomic layer deposition: a review

Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication

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