Nonsputtering impulse magnetron discharge

Plasma parameters of a pulsed high-current low-voltage non-sputtering magnetron discharge in light gases

“…The experiments were carried out in a special discharge device that is a cusped magnetic trap with a pair of electrodes whose shape replicates the magnetic field lines curvature (see [2] for details). The experimental setup scheme is shown in Fig.…”

“…Depending on operating conditions (including pulse duration), it is possible to transform long HiPIMS regime (L-HiPIMS) into the non-sputtering low-voltage mode at the same power level. This mode is known as non-sputtering magnetron discharge (NSMD) [2][3][4]. Introducing hydrogen or helium into NSMD might result in high density plasma generation with extremely low cathode material erosion rate.…”

Formation of low-frequency periodic structures in a pulsed magnetron discharge

“…Considerable effort is being made to determine the mechanisms of drifting ionization zones appearing in such plasmas, and to gain control over their formation. Our present contribution deals with the investigations of similar effects taking place in quasi-stationary magnetron discharges: high-current impulse magnetron discharge (HCIMD), and low-pressure high-current impulse diffuse discharge (HCIDD), also known as non-sputtering magnetron discharge (NSMD) [4,5]. HCIMD is a highvoltage (up to 1.5 kV), high-current (up to 20 A/cm 2 ), long (~ 1-40 ms) impulse sputtering tool [4].…”

“…Our present contribution deals with the investigations of similar effects taking place in quasi-stationary magnetron discharges: high-current impulse magnetron discharge (HCIMD), and low-pressure high-current impulse diffuse discharge (HCIDD), also known as non-sputtering magnetron discharge (NSMD) [4,5]. HCIMD is a highvoltage (up to 1.5 kV), high-current (up to 20 A/cm 2 ), long (~ 1-40 ms) impulse sputtering tool [4]. The low-voltage (~ 80 V) NSMD dramatically inhibits the sputtering rate thus limiting the deposition process under certain conditions.…”

“…The profile of each electrode replicates the magnetic field line curvature, ensuring E•B ≈ 0 along the most part of their surface. Further apparatus details could be found elsewhere [4,5].…”