Notching characteristics of un-doped amorphous silicon in high density plasma etching

Ko, Cheon-Kwang; Lee, Won Gyu

doi:10.1016/j.jiec.2008.08.018

Journal of Industrial and Engineering Chemistry

2009

DOI: 10.1016/j.jiec.2008.08.018

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Notching characteristics of un-doped amorphous silicon in high density plasma etching

Cheon-Kwang Ko

Won Gyu Lee

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Notching characteristics of un-doped amorphous silicon in high density plasma etching

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References 13 publications

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