Pulsed IR laser-induced ablation of bulk poly[oxy(tetramethyldisilane-1,2-diyl)], [(CH 3 ) 2 -Si(CH 3 ) 2 SiO] n ,yields thin polyoxocarbosilane films whose polymeric structure consists of a backbone composed of -(CH 3 ) 2 Si(CH 3 ) 2 SiO-and -O(CH 3 ) 2 SiO-units, which is cross-linked via SiSiC 2 O, C 3 SiO, C 2 SiHO, CSiHO 2 , and CSiO 3 moieties. These laser-fabricated hybrides of siloxanes and polysilylenes are insoluble in organic solvents and thermally superior to siloxanes and polysilylenes, which makes them intriguing for applications in thermally exposed devices.