“…Selective area epitaxy (SAE) [ 7 , 8 , 9 ] is one of the effective approaches to the implementation of these elements, using selective growth on patterned substrates with passivating masks, which exclude growth above them and ensure growth outside (i.e., in the so-called windows). There are a number of works demonstrating the use of SAE in the fabrication of different optical devices based on various material systems, including III-V (GaAs [ 8 , 10 , 11 ], InP [ 12 , 13 , 14 , 15 , 16 , 17 ]) and III-N semiconductor compounds (GaN [ 18 ], InGaN [ 19 ]). In particular, single-mode lasers with monolithically integrated modulators [ 20 , 21 ] and couplers [ 22 , 23 ] have been demonstrated.…”