“…There is also considerable interest for transition metal doped group IV semiconductors (Miyoshi et al, 1999, Park et al, 2002, Tsui et al, 2003, D'Orazio et al, 2004, Li et al, 2005, Demidov et al, 2006, Jamet et al, 2006, Collins et al, 2008, Ogawa et al, 2009, Tsuchida et al, 2009) to the semiconductor industry, owing in part to their excellent compatibility with silicon process technology. Several transition metals -including the use of single and co-doping of elements such as Mn, Cr, Co, Fe, Co-Mn, and Fe-Mn -have been used as magnetic dopants in both Si and Ge either through blanket implantation or through in-situ doping during epitaxial growth process.…”