International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217)
DOI: 10.1109/iedm.1998.746246
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Novel high power AlGaAs/GaAs HFET with a field-modulating plate operated at 35 V drain voltage

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Cited by 57 publications
(19 citation statements)
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“…Various technologies have been developed in the more mature GaAs material system to increase the breakdown voltage, including insulated gate [5], recessed gate [6], [7], overlapping gate [8], field plate (FP) over a stepped insulator [9], and field-modulating plate over an insulator [10]. Similar techniques are under development in GaN-based transistors, demonstrating good results.…”
mentioning
confidence: 99%
“…Various technologies have been developed in the more mature GaAs material system to increase the breakdown voltage, including insulated gate [5], recessed gate [6], [7], overlapping gate [8], field plate (FP) over a stepped insulator [9], and field-modulating plate over an insulator [10]. Similar techniques are under development in GaN-based transistors, demonstrating good results.…”
mentioning
confidence: 99%
“…Field plates enhance the breakdown voltage of device by decreasing the peak of electric field near gate edge towards drain [2][3][4][5][6][7][8][9] . Field plates also help in reducing the extent of virtual gate formation and thus improve the transient operation of the device 10 .…”
Section: Introductionmentioning
confidence: 99%
“…Increasing the device breakdown voltage means that the device can operate at higher voltages and thus, keeping constant the device current, higher output power levels. The second one is instead related to a reduction of a parasitic effect which is called DC-to-RF dispersion or drain current-collapse (Asano et al, 1998, Ando et al,2003Chini et al, 2004;Chini et al, 2008). When the device is affected by this phenomenon, drain current levels reached during RF operation are lower than those recorded during DC measurements.…”
Section: Introductionmentioning
confidence: 99%
“…While everything seems to be very exciting in terms of output power it is now mandatory to evaluate the effects of the added field plate structure to the small-signal performances of the device. Several authors have reported a decrease in device power gain when adding field plate structures (Asano et al, 1998;Ando et al, 2003;, and the main reason has been related to the added parasitic capacitance between the field plate and channel capacitance which gives rise to an increase in the device gate drain capacitance. The effect of increasing the gate drain capacitance is to reduce both the current gain cutoff frequency and the power gain cutoff frequency whose expression are given by (Ross et al, 1996):…”
Section: Output Power and Small Signal Parameters Dependence From Fiementioning
confidence: 99%
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