2022
DOI: 10.3390/polym15010005
|View full text |Cite
|
Sign up to set email alerts
|

Novel Mesogenic Vinyl Ketone Monomers and Their Based Polymers

Abstract: In the present research, we have synthesized new vinyl ketone monomers with mesogenic substituents, namely, 8-(3′-chloro-4′-pentyl-[1,1′-biphenyl-4-oxy)oct-1-en-3-one (BVK) and 8-[2′-chloro-4′′′-octyl-[1,1′:4′,1′′:4′′,1′′′-quaterphenyl-4-oxy]oct-1-en-3-one (QVK). The comparison of BVK, QVK, and previously synthesized 8-((4′′-((1R,4S)-4-butylcyclohexyl)-2′-chloro-[1,1′,4′,1′′-terphenyl]-4-yl)oxy)oct-1-en-3-one (TVK) has revealed that all of them are able to form crystals, while their ability to exhibit liquid c… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
3
0
4

Year Published

2023
2023
2023
2023

Publication Types

Select...
3

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(7 citation statements)
references
References 39 publications
0
3
0
4
Order By: Relevance
“…The photosensitivity of vinyl ketone monomers is determined by photochemistry of the carbonyl group; the latter property has been studied by many research groups ~50 years ago 17,35,36 . Accordingly, the ability to decompose under the influence of UV radiation is a key property of polyvinyl ketones and is used in the development of new materials and technologies 37–40 . Photolysis of aliphatic ketones proceeds via two simultaneous reactions 41 (Scheme 4).…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The photosensitivity of vinyl ketone monomers is determined by photochemistry of the carbonyl group; the latter property has been studied by many research groups ~50 years ago 17,35,36 . Accordingly, the ability to decompose under the influence of UV radiation is a key property of polyvinyl ketones and is used in the development of new materials and technologies 37–40 . Photolysis of aliphatic ketones proceeds via two simultaneous reactions 41 (Scheme 4).…”
Section: Resultsmentioning
confidence: 99%
“…17,35,36 Accordingly, the ability to decompose under the influence of UV radiation is a key property of polyvinyl ketones and is used in the development of new materials and technologies. [37][38][39][40] Photolysis of aliphatic ketones proceeds via two simultaneous reactions 41 (Scheme 4). The Norrish type I reaction causes the scission of the molecule and produces free radicals.…”
Section: Uv Photodegradationmentioning
confidence: 99%
“…S-(-)-Октан-2-ил-4'-гидрокси-[1,1'-бифенил]карбоксилат (2) [11,12], этил-6-(4'-пентил-3'хлор-[1,1'-бифенил-4-окси])гексаноат (3) [10], этил-6-(4'-циано-[1,1'-бифенил]-4-илокси)гексаноат (4) [13,14] были получены аналогично методам, которые приведены в указанных публикациях.…”
Section: экспериментunclassified
“…В продолжение этих исследований [6], учитывая их несомненную актуальность и практическую значимость, представляло интерес синтезировать новые соединения, обладающие наличием различных функциональных групп, способствующих специфическому взаимодействию с наночастицами, и изучить свойства анизотропных нанокомпозитов на их основе. Для осуществления данной цели была рассмотрена возможность получения разнообразных функциональных производных бифенила, включая хиральные, из коммерчески доступных 4',4бифенилдикарбоновой кислоты (I), 4'-гидрокси-4бифенилкарбоновой кислоты (II), 4'-гидрокси-4цианобифенила (III) и описанного нами ранее 4'пентил-3'-хлор-4-гидроксибифенила (IV) [10].…”
Section: Introductionunclassified
“…The photodegradation of PVK polymers has been reported in both polymer solutions and in material levels through Norrish II process (Scheme 1b). [27][28][29][30][31] However, the rate of the degradation can vary depending on the power of the UV source, with the degradation times changing from couple of days to few years. 32 In earlier studies, PVK containing thermoplastic elastomers have been synthesized, with fast and substantial degradation (>24 h) under strong source of UV light.…”
Section: Introductionmentioning
confidence: 99%