Novel Microcontacts in Microwave Chip Carriers Developed by UV-LIGA Process

Arnaudov, R.; Avdjiiski, B.; Kostov, Ana; Videkov, Valentin; Andreev, Svetozar; Yordanov, N.

doi:10.1109/tadvp.2005.849547

Cited by 9 publications

(4 citation statements)

References 8 publications

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“…Micromachining due to the high dimensional accuracy and the possibility of achieving high-aspect-ratio structures has the potential for the manufacturing of mm-wave components. Among different micromachining techniques, silicon-based micromachining [ 5 , 6 ], SU8 photoresist-based process [ 7 , 8 , 9 , 10 , 11 ], and LIGA-based thick layer electroplating [ 12 , 13 ] are suitable for manufacturing mm-wave components.…”

Section: Introductionmentioning

confidence: 99%

Dry Film Photoresist-Based Microfabrication: A New Method to Fabricate Millimeter-Wave Waveguide Components

et al. 2021

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This paper presents a novel fabrication method based on dry film photoresists to realize waveguides and waveguide-based passive components operating at the millimeter-wave frequency (30–300 GHz). We demonstrate that the proposed fabrication method has a high potential as an alternative to other microfabrication technologies, such as silicon-based and SU8-based micromachining for realizing millimeter-wave waveguide components. Along with the nearly identical transfer of geometrical structures, the dry film photoresist offers other advantages such as fewer processing steps, lower production cost, and shorter prototyping time over the conventional micromachining technologies. To demonstrate the feasibility of the fabrication process, we use SUEX dry film to fabricate a ridge gap waveguide resonator. The resonator is designed to exhibit two resonances at 234.6 and 284 GHz. The measured attenuation at 234 GHz is 0.032 dB/mm and at 283 GHz is 0.033 dB/mm for the fabricated prototype. A comparative study among different existing technologies indicates that the reported method can give a better unloaded Q-value than other conventional processes. The measured unloaded Q-values are in good agreement with the simulated unloaded Q-values. The signal attenuation indicates that SUEX dry film photoresists can be used to fabricate passive devices operating at millimeter-wave frequencies. Moreover, this new fabrication method can offer fast and low-cost prototyping.

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Section: Introductionmentioning

confidence: 99%

Dry Film Photoresist-Based Microfabrication: A New Method to Fabricate Millimeter-Wave Waveguide Components

et al. 2021

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“…On the other hand, several different micromachining technologies have been developed over the recent years. Among them, silicon deep dry etching [1,2], LIGA processing [3,4], and thick SU8 photoresist [5,6] are popular. We have recently reported a micromachined coaxial cable operating at 22 GHz with thick SU8 photoresist technology [7].…”

Section: Introductionmentioning

confidence: 99%

Design and realisation of low loss air‐filled rectangular coaxial cable with bent quarter‐wavelength supporting stubs

Wang

Lancaster

2008

Micro & Optical Tech Letters

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A new type of rectangular coaxial cable, operating from 28 to 48 GHz, was designed and fabricated with thick SU8 photoresist technology. Two pairs of bent quarter‐wavelength supporting stubs were proposed to reduce the lateral dimension of the structure. A size reduction of 40% was achieved by using the bent supporting stubs design as compared with a similar one with straight supporting stubs design. An average insertion loss of 0.36 dB across the bandwidth of 28‐48 GHz was achieved, with return loss of better than − 14 dB. The use of bent supporting stubs did not compromise its microwave performance. The component is, therefore, particularly appealing for integrated components such as complex couplers or Butler matrix, where overall size reduction (with no loss of performance) and cost saving can be substantial. © 2008 Wiley Periodicals, Inc. Microwave Opt Technol Lett 50: 1443–1446, 2008; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.23377

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“…This is the case of the SU-8 photoresist material process [346], DRIE [365] or LIGA [350], [366], techniques, already commented when hollow waveguides were reviewed for their used at THz frequencies in section 2.3.3.1. Unlike conventional milling techniques, in these photolitographic and chemical techniques, depth and size are preferred to be small.…”

Section: Hollow Metallic Waveguidesmentioning

confidence: 99%

“…Unlike conventional milling techniques, in these photolitographic and chemical techniques, depth and size are preferred to be small. In fact, achieving large dimensions is often a challenge [337]- [338], [346], [350], [365]- [366]. Therefore, whereas these techniques are mandatory at optical and infrared frequencies when dealing with dielectric, Sibased waveguides [465], and preferred at reasonably high THz frequencies for RWG designs [351], it makes little sense in forcing them down in frequency.…”

Section: Hollow Metallic Waveguidesmentioning

confidence: 99%

Analysis and design of efficient passive components for the millimeter-wave and THz bands

Verdú¹,

Antonio²

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To my parents, brother and sister."Success is peace of mind which is a direct result of self-satisfaction in knowing you made the effort to become the best of which you are capable."Jonh Wooden "Lo que con mucho trabajo se adquiere, más se ama." Aristóteles AgradecimientosLa realización de esta tesis ha implicado no pocos años de trabajo y esfuerzo. Durante este importante periodo de mi vida han sido muchas las personas han estado a mi lado, brindándome su apoyo, ayuda, cariño y amor. Ya sea de una forma u otra, todas estas personas han contribuido a que este trabajo haya sido posible dando como fruto esta tesis. A todos ellos, me gustaría dedicarles un agradecimiento muy especial de todo corazón.Sin duda alguna, debo dar las gracias en primer lugar a mi director de tesis Mariano Baquero. Mariano, has sido un padre para mí profesionalmente hablando. Te conocí como alumno en las clases de Microondas, en las cuales me abriste la puerta a un conocimiento que me fascinó.Recuerdo perfectamente cuando fui a verte para preguntarte si podrías dirigirme el Proyecto Final de Carrera, y desde ese año 2009 hemos estado trabajando juntos. Quiero agradecerte no sólo haberme dado la oportunidad de trabajar en cada momento en elárea que más me ha gustado, sino el haberte preocupado por mí a nivel personal, velando siempre por mis intereses, ayudándome a desarrollarme personal y profesionalmente. Extiendo en este sentido mi agradecimiento a Miguel Ferrando. Si Mariano es el padre, tu serías sin duda el abuelo. Sin tu ayuda, la beca para la realización de esta tesis y los proyectos que han respaldado la misma no hubieran sido posibles. Tu esfuerzo ha permitido que el Grupo de Radiación Electromagnética (GRE) esté hoy dónde esta y que sus miembros nos beneficiemos de un entorno de trabajo excelente, produciendo trabajo de calidad. Debo agradecerte también tus siempre innovadoras ideas, algunas de las cuales se han convertido en una realidad plasmada en esta tesis.Una mención especial merece Daniel Sánchez. Dani, aunque tu nombre no figure como co-director bien sabes que podría estarlo. Jamás podré agradecerte lo suficiente la ayuda que me has prestado. Cuántas horas dedicadas a enseñarme en un sin fin de aspectos sin esperar nada a cambio, apoyándome también en los momentos difíciles, siempre presentes en una tesis. Bien sabes que lo mismo has hecho con cada uno tus compañeros, por eso eres el pilar del GRE Dani.Otra persona a la que estoy muy agradecido es a Vicente Boria. Tu activa colaboración en la dirección de esta tesis ha sido indispensable para la consecución de los resultados más relevantes de la misma. Sugeriste muy acertadamente una estancia en la Queen's University of Belfast, y me abriste la puerta a nuevas líneas de investigación en las cuales seguimos trabajando actualmente. Gracias por preocuparte por mi a nivel profesional y personal.En elámbito anterior, extiendo los agradecimientos a todo el GRE. It is also very important for me to acknowledge Prof. Vince Fusco. Thank you for hosting me in your group in Belfast ...

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Novel Microcontacts in Microwave Chip Carriers Developed by UV-LIGA Process

Cited by 9 publications

References 8 publications

Dry Film Photoresist-Based Microfabrication: A New Method to Fabricate Millimeter-Wave Waveguide Components

Dry Film Photoresist-Based Microfabrication: A New Method to Fabricate Millimeter-Wave Waveguide Components

Design and realisation of low loss air‐filled rectangular coaxial cable with bent quarter‐wavelength supporting stubs

Analysis and design of efficient passive components for the millimeter-wave and THz bands

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