2009
DOI: 10.1002/pssc.200881116
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Novel phosphors based on porous materials

Abstract: Technological conditions have been developed for the preparation of nanocomposite phosphors based on porous InP, GaP and GaAs semiconductor as well as Al2O3 and TiO2 dielectric templates doped with rare earth and transition metal ions.Semiconductor and dielectric templates are prepared by electrochemical treatment of bulk semiconductor substrates and metallic plates, respectively. Doping is performed by impregnation from liquid solutions followed by thermal treatment. (© 2009 WILEY‐VCH Verlag GmbH & Co. KG… Show more

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Cited by 6 publications
(5 citation statements)
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“…In order to inhibit and easily control the oxidation of the porous template it was proposed to perform the annealing in nitrogen flow containing less than 1% oxygen. The conditions of thermal treatment also determine the crystallographic structure of the native oxides formed and that of rare earth compounds [152].…”
Section: Nanocomposite Materials Based On Porous Semiconductorsmentioning
confidence: 99%
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“…In order to inhibit and easily control the oxidation of the porous template it was proposed to perform the annealing in nitrogen flow containing less than 1% oxygen. The conditions of thermal treatment also determine the crystallographic structure of the native oxides formed and that of rare earth compounds [152].…”
Section: Nanocomposite Materials Based On Porous Semiconductorsmentioning
confidence: 99%
“…Porous GaP [150,152,[175][176][177][178] and GaAs [151,152,178] templates have been widely used for the preparation of nanocomposite materials via impregnation processes with rare earth containing solutions followed by thermal treatment to optically activate the rare earth ions. Preparation of various nanocomposite phosphors with the composition and structure controlled by technological conditions has been demonstrated, and efficient optical activation of Er 3+ , Eu 3+ , and Tb 3+ ions was observed as a result of PL and CL investigation.…”
Section: Photo-and Cathodoluminescencementioning
confidence: 99%
“…An attractive alternative is to enhance the development of other porous III-V semiconductor compounds, such as GaP, InP , and GaAs as well as the wide bandgap and corrosion resistant materials like GaN and SiC. [8][9][10][11][12][13] Wide bandgap III-nitride semiconductors are generally grown on sapphire or SiC substrates. The GaN, sapphire, and 6H À SiC semiconductors have in-plane lattice constants of 3.189 Å , 4.758 Å , and 3.08 Å , respectively, and have a thermal expansion coefficients of 5.59 Â 10 À6 /K, 7.5 Â 10…”
mentioning
confidence: 99%
“…For all these reasons there is a strong effort in fabrication procedures both in academic and in industrial laboratories. Porous metal and semiconductors are generally fabricated by electrochemical methods, like dealloying (Cu, Pt, Pd, Au, and Ag) [1][2][3] and selective etching (Si, SiC, TiO 2 , InP, GaP, GaAs) [4,5], but also exploiting the possibilities of classic micromachining techniques, such as chemical vapors deposition or plasma enhanced chemical vapors deposition, and electro-spinning [6]. Depending on the parameters of he fabrication processes, but also on the characteristics of the bulk materials (doping level, orientation, purity, and so on), a very broad range of porosity and pore size dimensions can be achieved: again, in the case of the porous silicon, porosities between 30% and 90%, and pores size ranging in the nanometer to micrometer interval, can be easily obtained.…”
mentioning
confidence: 99%