2014 IEEE 64th Electronic Components and Technology Conference (ECTC) 2014
DOI: 10.1109/ectc.2014.6897493
|View full text |Cite
|
Sign up to set email alerts
|

Novel sealing technology for organic EL display and lighting by means of modified surface activated bonding method

Abstract: For a sealing of organic electro luminescence displays and lightings, a room temperature bonding of polymer films without organic adhesives is required. This paper describes a new bonding technique called modified surface activated bonding (mSAB) method using nano-adhesion layer that meets the requirement. Polymer films such as PEN, PET and PI can be bonded by this method. Especially PEN and PET films are so strongly bonded that the bond interface has tolerance for bending and loci of fracture after a peeling … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4

Citation Types

0
4
0

Year Published

2015
2015
2024
2024

Publication Types

Select...
3
1
1

Relationship

1
4

Authors

Journals

citations
Cited by 5 publications
(4 citation statements)
references
References 11 publications
0
4
0
Order By: Relevance
“…To apply this method to polymers, a modified SAB ( m -SAB) was introduced that utilizes an additional coating of silicon nanofilms on the polymeric substrates . To cope with the intrinsic properties of the polymer substrates, such as surface roughness and thermal damage, the selection of the intermediate coating layers and plasma conditions should be carefully adjusted. This process, however, requires high-end processes such as nanofilm sputtering, ultrahigh vacuum, and high-voltage plasma. …”
Section: Introductionmentioning
confidence: 99%
“…To apply this method to polymers, a modified SAB ( m -SAB) was introduced that utilizes an additional coating of silicon nanofilms on the polymeric substrates . To cope with the intrinsic properties of the polymer substrates, such as surface roughness and thermal damage, the selection of the intermediate coating layers and plasma conditions should be carefully adjusted. This process, however, requires high-end processes such as nanofilm sputtering, ultrahigh vacuum, and high-voltage plasma. …”
Section: Introductionmentioning
confidence: 99%
“…Chen et al [ 17 ] bonded two pieces of polyimide films by heating at 250 °C for 60 min in an oven, finding that voids inevitably existed either at the bonding interface or within the bulk films. A modified surface activated bonding (mSAB) method was proposed to bond polyimides by a thin intermediate activated metallic layer, which is promising, although the metallic layer may cause short circuit and failure when through-silicon-via technology is involved [ 18 ]. So far, it is still challenging to develop a low-temperature bonding method for ordinary polyimide to meet the requirements of low thermal budget, high throughput, and reliability.…”
Section: Introductionmentioning
confidence: 99%
“…Chih Chen et al [17] bonded two pieces of polyimide films by heating at 250 °C for 60 min in an oven, finding that voids inevitably existed either at the bonding interface or within the bulk films. A modified surface activated bonding (mSAB) method was proposed to bond polyimides by a thin intermediate activated metallic layer, which is promising while the metallic layer may cause short circuit and failure when through-silicon-via technology is involved [18]. So far, it is still challenging to develop a low-temperature bonding method for ordinary polyimide to meet the requirements of low thermal budget, high throughput, and reliability.…”
Section: Introductionmentioning
confidence: 99%