“…[10][11][12] However, while the reliance of intrinsic forces leads to robustness and predictability in pattern formation, such thin film self-organization invariable limits the control over pattern length scale to the form λ ∝ h n , where λ is the self-organized length, h is the film thickness and n varies depending on the conditions used. For instance, in the well studied liquid-phase spinodal dewetting instability, the pattern length scale λ varies with film thickness h as λ ∝ h 211, [13][14][15] and could be modified somewhat by introducing thermal gradients, 16 or by relying on solid state mass transport. 17 While some other ways to overcome this constraint have been demonstrated for polymer liquid films, such as by chemical or morphological modifications to the substrate surface, 18-20 similar flexibility has not been shown for the vast majority of high temperature fluids, such as metals and semiconductors.…”