Gate patterning on semiconductors is routinely used to electrostatically restrict electron movement into reduced dimensions. At cryogenic temperatures, where most studies are carried out, differential thermal contraction between the patterned gate and the semiconductor often lead to an appreciable strain modulation. The impact of such modulated strain to the conductive channel buried in a semiconductor has long been recognized, but measuring its magnitude and variation is rather challenging. Here we present a way to measure that modulation in a gate-defined GaAs-based onedimensional channel by applying resistively-detected NMR (RDNMR) with in-situ electrons coupled to quadrupole nuclei. The detected strain magnitude, deduced from the quadrupole-split resonance, varies spatially on the order of 10 −4 , which is consistent with the predicted variation based on an elastic strain model. We estimate the initial lateral strain xx developed at the interface to be about 3.5 × 10 −3 .In many semiconductor-based quantum systems, electrons are manipulated by applying voltages to the surface metal gates. For example, a combination of nanoscale metal gates and GaAs based two-dimensional systems enables us to realize one-dimensional quantum channel and zero-dimensional quantum dot by depleting electrons under the gates[1]. These building blocks are integrated into many quantum devices, such as quantum computing/simulating systems based on electron spins [2][3][4]. Electron control in these systems is always accompanied by electron position change from the originally twodimensional sheet. One can expect microscopic strain distribution in such devices because surface metal gate and semiconductor system have different thermal expansion coefficients and complicated nanometer surface gates should produce a complicated strain pattern inside. Such phenomena are common for all semiconductor systems including silicon and other semiconductor groups. However, the strain variation felt by confined electrons has not received much attention up to now partly because a lack of appropriate and precise measurement tool to probe local strain in nanometer scale electron channel. Here, taking GaAs-based quantum-point-contact (QPC)[5, 6] as a prototypical example, we demonstrate that electrons flowing in the one-dimensional channel feel different strain even in the same device when the channel position is microscopically shifted by changing the gate voltage.There are a couple of methods to measure spatial strain distribution in materials. Examples include X-ray diffraction [7,8], electron microscopy [9,10], and Raman spectroscopy [11][12][13]. Although those techniques are capable of delivering a high-spatial resolution strain profile, they are only sensitive to strain magnitude larger than a factor of 10 −4 . Alternative technique such as solidstate NMR could provide an acceptable solution since it has the ability to detect ultra low-level strain variation of less than 10 −4 through nuclear quadrupolar interaction with the electric field gradient ...