2020
DOI: 10.35848/1347-4065/ab6a2c
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Numerical analysis of p-type and n-type based carrier-selective contact solar cells with tunneling oxide thickness and bulk properties

Abstract: Tunnel Oxide Passivated Contact (TOPCon) is a c-Si solar cell structure with tunneling oxide near the rear electrode. A full-area tunneling oxide provides sufficient passivation and low internal resistance with 1D carrier transport. Carrier tunneling mechanism is the key factor of a TOPCon solar cell; the thicker the tunneling oxide, the better is its ability to prevent minority-carrier tunneling. However, excessively thick oxide degrades majority-carrier tunneling. Therefore, the relationship between tunnelin… Show more

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Cited by 9 publications
(3 citation statements)
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“…The carrier tunnel transport model at the Si/tunnel‐oxide interface is required for modeling TOPCons (see Figure 3B). To express the tunneling current, the direct tunneling model 103 is used, 104 with dielectric constant εox ${\varepsilon }_{ox}$, carrier effective masses me,h ${m}_{e,h}$, and barrier heights at the interface normalΔΦC,V ${\rm{\Delta }}{{\rm{\Phi }}}_{C,V}$ as the input parameters. Here, the use of the direct tunneling model assumes the uniform formation of the tunneling layer as the trapezoidal barrier is estimated, which the TOPCon will be applicable.…”
Section: Numerical Simulation Of C‐si Solar Cellsmentioning
confidence: 99%
“…The carrier tunnel transport model at the Si/tunnel‐oxide interface is required for modeling TOPCons (see Figure 3B). To express the tunneling current, the direct tunneling model 103 is used, 104 with dielectric constant εox ${\varepsilon }_{ox}$, carrier effective masses me,h ${m}_{e,h}$, and barrier heights at the interface normalΔΦC,V ${\rm{\Delta }}{{\rm{\Phi }}}_{C,V}$ as the input parameters. Here, the use of the direct tunneling model assumes the uniform formation of the tunneling layer as the trapezoidal barrier is estimated, which the TOPCon will be applicable.…”
Section: Numerical Simulation Of C‐si Solar Cellsmentioning
confidence: 99%
“…TCAD simulations have examined the impact of tunnelling oxide thickness and bulk properties on p-TOPCon cell performance. 33 Gao et al reported a simulation study of a 22.40% p-TOPCon structure using the Quokka software with industrial-grade process parameters. 34 A logical, numerical study is mandatory for a deeper knowledge of significant factors that influence how well the devices perform.…”
Section: Introductionmentioning
confidence: 99%
“…As aforementioned, poly-Si/SiO x structured electron and hole contacts exhibit different carrier transport mechanisms. ,,,, Figure b,c shows the transport behaviors of photogenerated electrons and holes in their respective contacts. In electron contacts, photogenerated electrons are collected through SiO x , as schematically shown in Figure b.…”
Section: Introductionmentioning
confidence: 99%