2020
DOI: 10.2494/photopolymer.33.245
|View full text |Cite
|
Sign up to set email alerts
|

Numerical Analysis of Pattern Shape Deformation in UV Imprint Due to Curing Shrinkage

Abstract: The accuracy of a numerical modeling method for UV imprint processes to simulate the UV resin deformation due to UV shrinkage was evaluated. Typical UV resins induce volumetric shrinkage by several percent after UV curing. The curing shrinkage deforms the pattern shape and could be a significant issue in UV imprint for high-precision pattern moldings such as optical device patterning. Taking notice of the analogy between UV imprint and thermal imprint, the modeling method introduces the idea of "virtual temper… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 20 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?