2024
DOI: 10.1088/1361-6595/ad4ddb
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Numerical characterization of capacitively coupled CF4 plasmas modulated by anion beam injection

Youyou Zhou,
Jingwen Xu,
Yu Wang
et al.

Abstract: In the study of electronegative CF4 capacitively coupled plasmas (CCP), plasma modulation is typically achieved by varying parameters such as pressure and voltage, et al. In this work, the particle-in-cell/Monte Carlo (PIC/MC) method is used to simulate modulation of CF4 CCP with injection of anions (F-) ion beam (FB). The results demonstrate that FB injection effectively enhances the dissociation collision process between F- ions and neutral molecules, thus altering the densities of electrons and ions. An eff… Show more

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