2011
DOI: 10.5757/jkvs.2011.20.6.422
|View full text |Cite
|
Sign up to set email alerts
|

Numerical Investigation of Ion and Radical Density Dependence on Electron Density and Temperature in Etching Gas Discharges

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 23 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?