2010
DOI: 10.1143/jjap.49.086001
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Numerical Simulation of Electron Transport in Electric and Magnetic Fields for Analysis of Electron Temperature and Number Density Profiles Measured in Argon Magnetic Neutral Loop Discharge Plasma

Abstract: A Monte Carlo simulation of electron transport in electric and magnetic fields was performed to analyze experimental data of the electron temperature T e and electron number density n e measured in a magnetic neutral loop discharge (NLD) plasma driven in Ar at 0.13 Pa. T e and n e in the vicinity of the substrate holder were measured with a triple probe, and their radial profiles had peaks at different radial positions.The simulation reproduced these peak positions well under the chosen boundary condition that… Show more

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Cited by 14 publications
(17 citation statements)
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“…A similar off-separatrix peak of the electron distribution is seen in an experimental result of Sugawara et al (2010) as well. Figure 4 shows the distribution of the mean electron energyε(r, z).…”
Section: Electron Distributionsupporting
confidence: 82%
“…A similar off-separatrix peak of the electron distribution is seen in an experimental result of Sugawara et al (2010) as well. Figure 4 shows the distribution of the mean electron energyε(r, z).…”
Section: Electron Distributionsupporting
confidence: 82%
“…It was reported that the space charge field had the function of maintaining a high number of electrons [12]. In another report, the electron reflectivity at the vessel wall was set high as an alternative effect of the space charge field [5]. In the present simulation, the electron reflectivity was set at 100%.…”
Section: Trace Of Electronsmentioning
confidence: 87%
“…On the basis of this understanding, it has been reported that the etching rate profile on the substrate can be made uniform by varying the NL radius dynamically [3,4]. Recently, a computational analysis by the authors revealed that the electrons gain energy near the NL and are transported along the separatrix, which is the boundary dividing the plasma space into four regions according to the direction of the magnetic field lines [5]. The etchant production, as a result, is distributed not only in the vicinity of the NL but also along the separatrix [5].…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…The electrons were traced for 200 RF periods and sampled in the last 50 to obtain the time-averaged electron distribution after the initial relaxation process. We assumed a high electron reflectivity of 0.99 at the sidewall, ceiling, and bottom of the vessel, regarding it as the sum of the surface reactions such as electron absorption and emission of the secondary electrons [6]. Fig.…”
mentioning
confidence: 99%