2024
DOI: 10.7498/aps.73.20240436
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Numerical simulation of inductively coupled Ar/O<sub>2</sub> plasma

Yu-Han Zhang,
Xin-Qian Zhao,
Ying-Shuang Liang
et al.

Abstract: In the inductively coupled plasma (ICP) discharge, surface processes, such as reflection, de-excitation, and recombination, can occur when active species arrive at material surfaces, which accordingly influences the plasma properties. In this work, a fluid model is carried out to study the Ar/O<sub>2</sub> plasma generated by ICP reactors made of different materials. In simulation, sticking coefficient is employed to estimate the surface reactions on different materials. As the reactor material cha… Show more

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