Numerical Solution for Radiative Heat Transfer in a Novel Polysilicon CVD Reactor

Huang, Zhe; Ding, Hao; Wang, Xiao Jing; Liu, Chun Jiang

doi:10.1080/10407782.2013.798206

Cited by 14 publications

(5 citation statements)

References 23 publications

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“…It is noted that the current intensity through the rod can be calculated by integrating the local current density over the cross-sectional area, defined as Eq. (9). It is clear that lower radial temperature results in lower conductivity in the rod located in the inner ring, which causes the current intensity curve for the silicon rod in the inner ring is lower at the end of the process as shown in Fig 6. …”

Section: Influence Of Rod's Locationmentioning

confidence: 90%

“…Many researches have been carried out and published in the open literatures. Huang et al [8,9] have carried out a series of theoretical studies to investigate the radiative heat transfer between the rods and the inner shield in a novel polysilicon CVD reactor. The simulation results show that improving the polysilicon growth rate, enlarging the reactor capacity and decreasing the inner shield emissivity can reduce the energy loss of the CVD reactor.…”

Section: Introductionmentioning

confidence: 99%

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Electric heating of the silicon rods in Siemens reactor

Nie

Hou

Xie

et al. 2015

International Journal of Heat and Mass Transfer

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Section: Influence Of Rod's Locationmentioning

confidence: 90%

Section: Introductionmentioning

confidence: 99%

Electric heating of the silicon rods in Siemens reactor

Nie

Hou

Xie

et al. 2015

International Journal of Heat and Mass Transfer

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“…By numerical simulation, the deviation of the velocity and the concentration fields in willow leaflike static mixer were reached to ideal range [3]. Huang ZheQing et al used the standard k-ε turbulence model to simulate poly-crystalline silicon reduction furnace and found that the use of flat flow can control the temperature field in the furnace [4,5]. The results can solve the problem of furnace temperature uniformity and reduce the power consumption of reduction furnace.…”

Section: Introductionmentioning

confidence: 99%

Numerical Simulation Study of Turbulent Flow in Vacuum Tempering Furnace Using K-Epsilon Model

Chen¹,

Jiang²,

Gao³

2019

TFAMENA

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Vacuum tempering furnace prevalence of uneven temperature problems. In this paper, numerical analyses for turbulent flow inside vacuum tempering furnace using k-ε turbulence model. The moving reference frame is helpful to improve the precision of the model. Not only the loading area and its adjacent components have an influence on temperature uniformity, but the shape of the auxiliary parts, the shape of the driving parts and the way of loading have an influence. The influence factors of turbulence are studied from multiple angles. Based on the factors, the combinatorial optimization scheme is proposed and temperature uniformity test is carried out. The results show that the shape of the fan blade, the inlet diameter of the gas guide tube, the shape of the centre channel and the shape of the wind scooper influences furnace temperature uniformity. The adjustment of loading area and the use of multiple central channels in equal area will not affect furnace temperature uniformity.

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“…Gum et al patented a process in which energy consumption is reduced by using a thin layer of gold inside the reactor chamber. Liu et al developed a low energy consumption polysilicon CVD reactor and described various transport phenomena in the reactor using a computational fluid dynamics (CFD) method. Moreover, Vigano et al presented a technique for a real‐time model‐based predictive control applied to a laboratory‐scale Siemens reactor, and used a lumped model to describe the CVD process.…”

Section: Introductionmentioning

confidence: 99%

Numerical simulation of multiple polysilicon CVD reactors connected in series using CFD method

et al. 2015

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This study proposes a novel process in which multiple polysilicon chemical vapour deposition (CVD) reactors are connected in series, and this setup is investigated using computational fluid dynamics (CFD). A three-dimensional CFD theoretical model is proposed to describe the various transport phenomena in the reactor, and this model is validated by comparing the reactor outlet temperatures of the simulation results and the data obtained using an industrial polysilicon CVD reactor. This model was then used for analyzing the production cost and growth rate of the traditional and proposed CVD processes. The simulation results show that the polysilicon production cost in the traditional and proposed processes is lowest for 0.091 mol/mol (9.1 mol%); the maximum deposition rate is achieved for 0.25 mol/mol (25 mol%). On the other hand, if the operation pressure increases from 101 to 607 kPa, the average production cost can be reduced from 86.26 to 39.88 $/kg; and the average growth rate can be raised from 1.68 to 4.18 mm Á min À1. In addition, compared with the 1-reactor process, the cost of the 2-reactor process is 21.9 % lower, and the 3-reactor process is 26.9 % lower. Finally, in the novel process, changing the chlorine hydride of the feed in the reactor 2 from 0.1 g/g (10 wt%) to 0.02 g/g (2 wt%), the average production cost can be reduced by 35.5 %.

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Numerical Solution for Radiative Heat Transfer in a Novel Polysilicon CVD Reactor

Cited by 14 publications

References 23 publications

Electric heating of the silicon rods in Siemens reactor

Electric heating of the silicon rods in Siemens reactor

Numerical Simulation Study of Turbulent Flow in Vacuum Tempering Furnace Using K-Epsilon Model

Numerical simulation of multiple polysilicon CVD reactors connected in series using CFD method

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