O<sub>2</sub>
/HMDSO-Plasma-Deposited Organic-Inorganic Hybrid Film for Gate Dielectric of MgZnO Thin-Film Transistor

Tsai, Chang‐Her; Li, Yun-Shiuan; Cheng, I-Chun; Chen, Jian-Zhang

doi:10.1002/ppap.201300107

Cited by 20 publications

(10 citation statements)

References 45 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The opening of double and triple bonds and the addition of free radicals to the unsaturated bonds offer more polymer formation pathways than simple recombination of two activated alkane fragments. Therefore, a proper choice of the precursor in combination with a clever selection of deposition parameters could lead to the controllable incorporation of required chemical groups, such as −COOH, −OH, −NH 2 , −SH, and −Br, among others, and to the synthesis of functionalized PPFs with specific properties for application in various domains, including microelectronics, 149 membranes and barriers, 150−152 chemical sensors, 153 and biomedicine. 17,154 It should also be mentioned that a gas mixture of two precursors can generate a copolymer-like PPF with a structure resembling that of one or the other monomer depending on their concentration ratio.…”

Section: < < Alkanes Alkenes Alkynesmentioning

confidence: 99%

“…At the same time, cyclic, alicyclic, and aromatic precursors are characterized by higher polymerizabilities, and hence deposition rated, than aliphatic precursors because of the possibility of introduce the whole initial structures through plasma-induced grafting. , Among aliphatic precursors the following tendency in polymerization as a function of the degree of saturation has been observed The opening of double and triple bonds and the addition of free radicals to the unsaturated bonds offer more polymer formation pathways than simple recombination of two activated alkane fragments. Therefore, a proper choice of the precursor in combination with a clever selection of deposition parameters could lead to the controllable incorporation of required chemical groups, such as −COOH, −OH, −NH 2 , −SH, and −Br, among others, and to the synthesis of functionalized PPFs with specific properties for application in various domains, including microelectronics, membranes and barriers, − chemical sensors, and biomedicine. , …”

Section: Plasma Polymerization: a Particular Type Of Thin-film Plasma...mentioning

confidence: 99%

See 1 more Smart Citation

Free-Radical-Induced Grafting from Plasma Polymer Surfaces

et al. 2016

View full text Add to dashboard Cite

With the advances in science and engineering in the second part of the 20th century, emerging plasma-based technologies continuously find increasing applications in the domain of polymer chemistry, among others. Plasma technologies are predominantly used in two different ways: for the treatment of polymer substrates by a reactive or inert gas aiming at a specific surface functionalization or for the synthesis of a plasma polymer with a unique set of properties from an organic or mixed organic-inorganic precursor. Plasma polymer films (PPFs), often deposited by plasma-enhanced chemical vapor deposition (PECVD), currently attract a great deal of attention. Such films are widely used in various fields for the coating of solid substrates, including membranes, semiconductors, metals, textiles, and polymers, because of a combination of interesting properties such as excellent adhesion, highly cross-linked structures, and the possibility of tuning properties by simply varying the precursor and/or the synthesis parameters. Among the many appealing features of plasma-synthesized and -treated polymers, a highly reactive surface, rich in free radicals arising from deposition/treatment specifics, offers a particular advantage. When handled carefully, these reactive free radicals open doors to the controllable surface functionalization of materials without affecting their bulk properties. The goal of this review is to illustrate the increasing application of plasma-based technologies for tuning the surface properties of polymers, principally through free-radical chemistry.

show abstract

Section: < < Alkanes Alkenes Alkynesmentioning

confidence: 99%

Section: Plasma Polymerization: a Particular Type Of Thin-film Plasma...mentioning

confidence: 99%

Free-Radical-Induced Grafting from Plasma Polymer Surfaces

et al. 2016

View full text Add to dashboard Cite

show abstract

“…Plasma Enhanced Chemical Vapor Deposition, PECVD, has emerged as a clean, simple and cost-effective methodology for the production of silicon-based coatings. Many studies, employing plasma deposition and hexamethyldisiloxane, HMDSO, as the starting material, have demonstrated the convenience of this method to prepare nanocomposites for the controlled release of silver [1], ice repellent coatings [2], humidity sensors [3], gas permeation barriers [4], dielectric films for gates in MgZnO transistors [5], corrosion resistant layers for Al 2024 and magnesium [6][7] as well as protective gradient coatings [8]. Thus, a broad range of structures have been prepared using the PECVD of HMDSO.…”

Section: Introductionmentioning

confidence: 99%

Effect of the plasma excitation power on the properties of SiOxCyHz films deposited on AISI 304 steel

Santos

Gonçalves

Amorim

et al. 2017

Surface and Coatings Technology

View full text Add to dashboard Cite

Films were produced on stainless-steel substrates by radiofrequency Plasma Enhanced Chemical Vapor Deposition (RF-PECVD) of mixtures containing 70% hexamethyldisiloxane, 20% oxygen and 10% argon. While the plasma excitation power was varied from 15 to 75 W, the deposition time and total gas pressure were kept constant at 1800 s and 8.0 Pa, respectively. The influences of the plasma power on the plasma kinetics and the ion bombardment of the growing film are discussed. Film composition and chemical structure were determined using X-ray photoelectron-and infrared reflectance-absorbance spectroscopy, respectively. Profilometry was used to measure the thicknesses of the resulting layers. The root mean square roughness was evaluated from surface topographic profiles acquired by atomic force microscopy. Scanning electron microscopy and energy dispersive spectroscopy were employed to evaluate the morphology and elemental composition of the coatings. Electrochemical impedance spectroscopy and potentiodynamic polarization tests were used to derive the corrosion resistance of the samples to a saline solution. Substantial changes in the material structure and progressive increases in film thickness were observed with increasing applied power. The resulting material was an organosilicon layer composed of Si\ \O backbones surrounded by methyl groups, very similar to conventional polydimethylsiloxane. Increases in the proportions of Si\ \O and methylsilyl groups in the structure were observed at greater plasma excitation powers, indicating densification of the structure owing to greater ion bombardment. The surface morphology and roughness were also dependent on the treatment power. Independently of the deposition conditions, application of the film increased the corrosion resistance of the stainless steel. A 10,000-fold elevation in the total system resistance under electrochemical testing was achieved for the film prepared with the greatest ion bombardment intensity. Film thickness was observed to be a key parameter but the coating structure had a major effect on this result.

show abstract

“…Organosilicon‐oxygen mixtures are widely used for thin film deposition and they are of particular interest in gas sensor applications and in applications as barrier films for food, corrosion protection layer, pharmaceutical packaging for biocompatible materials, dielectric layers, microelectronics, and optics . Among the different organosilicon precursors available, tetraethoxysilane (TEOS), tetramethoxysilane (TMOS) tetramethyldisiloxane (TMDSO), hexamethyldisilazane (HMDS) and hexamethyldisiloxane (HMDSO) have been extensively studied .…”

Section: Introductionmentioning

confidence: 99%

Study of the Stability and Hydrophilicity of Plasma-Modified Microfluidic Materials

Silva

Zhang

Schelcher

et al. 2016

Plasma Process. Polym.

View full text Add to dashboard Cite

Polymers among new classes of materials such as polydimethylsiloxane (PDMS), cyclic olefin copolymer (COC), Norland optical adhesive (NOA), and THV (fluoropolymer) were evaluated as surface-modified microfluidic materials, including investigating the incorporation of silicalike functional groups onto these surfaces. The functionalization of these materials was performed using a hybrid reactor equipped with magnetron sputtering using a silica target and with a PECVD apparatus starting from hexamethyldisiloxane as a chemical precursor. Coated microfluidic materials were then evaluated in terms of wettability, stability, composition, and structure. The deposited coatings were proved to be stable up to 2 month in air and water storage for these materials, with COC providing the most stable substrate. (7 of 15) 1600034 www.plasma-polymers.org PECVD: 150 W plasma discharge power, 4 min deposition time, 150 sccm oxygen flow rate, and 0.3 mbar precursor pressure.Sputtering: 150 W plasma discharge power, 60 min deposition time, 30 sccm Ar flow rate, and 150 sccm O 2 flow rate. (11 of 15) 1600034 www.plasma-polymers.org PECVD: 150 W plasma discharge power, 4 min deposition time, 150 sccm oxygen flow rate, and 0.3 mbar precursor pressure. Sputtering: 150 W plasma discharge power, 60 min deposition time, 30 sccm Ar flow rate, and 150 sccm O 2 flow rate.

show abstract

O₂ /HMDSO-Plasma-Deposited Organic-Inorganic Hybrid Film for Gate Dielectric of MgZnO Thin-Film Transistor

Cited by 20 publications

References 45 publications

Free-Radical-Induced Grafting from Plasma Polymer Surfaces

Free-Radical-Induced Grafting from Plasma Polymer Surfaces

Effect of the plasma excitation power on the properties of SiOxCyHz films deposited on AISI 304 steel

Study of the Stability and Hydrophilicity of Plasma-Modified Microfluidic Materials

Contact Info

Product

Resources

About

O2 /HMDSO-Plasma-Deposited Organic-Inorganic Hybrid Film for Gate Dielectric of MgZnO Thin-Film Transistor

Cited by 20 publications

References 45 publications

Free-Radical-Induced Grafting from Plasma Polymer Surfaces

Free-Radical-Induced Grafting from Plasma Polymer Surfaces

Effect of the plasma excitation power on the properties of SiOxCyHz films deposited on AISI 304 steel

Study of the Stability and Hydrophilicity of Plasma-Modified Microfluidic Materials

Contact Info

Product

Resources

About

O₂ /HMDSO-Plasma-Deposited Organic-Inorganic Hybrid Film for Gate Dielectric of MgZnO Thin-Film Transistor