A photochemical box model incorporating the Master Chemical Mechanism (v3.2), constrained with a full suite of measurements, was developed to investigate the photochemical reactivity of volatile organic compounds at a semirural site (Mount Tai Mo Shan (TMS)) and an urban site (Tsuen Wan (TW)) in Hong Kong. The levels of ozone (O 3 ) and its precursors, and the magnitudes of the reactivity of O 3 precursors, revealed significant differences in the photochemistry at the two sites. Simulated peak hydroperoxyl radical (HO 2 ) mixing ratios were similar at TW and TMS (p = 0.05), while the simulated hydroxyl radical (OH) mixing ratios were much higher at TW (p < 0.05), suggesting different cycling processes between OH and HO 2 at the two sites. The higher OH at TW was due to high-NO mixing ratios, which shifted the HO x (OH + HO 2 ) balance toward OH by the propagation of HO 2 and alkyl peroxy radicals (RO 2 ) with NO. HO x production was dominated by O 3 photolysis at TMS, but at TW, both HCHO and O 3 photolyses were found to be major contributors. By contrast, radical-radical reactions governed HO x radical losses at TMS, while at TW, the OH + NO 2 reaction was found to dominate in the morning and the radical-radical reactions at noon. Overall, the conversion of NO to NO 2 by HO 2 dictated the O 3 production at the two sites, while O 3 destruction was dominated by the OH + NO 2 reaction at TW, and at TMS, O 3 photolysis and the O 3 + HO 2 reaction were the major mechanisms. The longer OH chain length at TMS indicated that more O 3 was produced for each radical that was generated at this site.