2011
DOI: 10.4028/www.scientific.net/kem.497.8
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Observation of Magnetic Compton Profile of Interface Controlled Co/Pd Multilayer

Abstract: We compare two Co/Pd multilayers with correspondingly smooth and rough interfaces. The first is a Co (1.5 nm)/Pd (2.6 nm) multilayer with a smooth interface deposited by the MBE technique, and the second is a Co (1.6 nm)/Pd (4.0 nm) multilayer with a rough interface deposited by the sputter technique. Both multilayers have almost the same perpendicular magnetic anisotropy energy, 1.15 Merg/cc for the Co (1.5 nm)/Pd (2.6 nm) multilayer and 1.20 Merg/cc for the Co (1.6 nm)/Pd (4.0 nm) multilayer, respectively. T… Show more

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Cited by 8 publications
(16 citation statements)
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“…They pointed out that PMA decreases due to diffusion at rough interfaces. In accordance with [37,38] studies, it is suggested in our case that the Ti under-layer supports PMA by making both the Pt and Co surface smoother (i.e.…”
Section: Resultssupporting
confidence: 89%
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“…They pointed out that PMA decreases due to diffusion at rough interfaces. In accordance with [37,38] studies, it is suggested in our case that the Ti under-layer supports PMA by making both the Pt and Co surface smoother (i.e.…”
Section: Resultssupporting
confidence: 89%
“…On the other hand, the RMS roughness value (204. promoting PMA [37][38][39]. In our case, the sharper interface (or less rough interface) between Pt and Co layer may also help to promote the PMA in tpcp samples.…”
Section: Resultsmentioning
confidence: 60%
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“…The roughness of the Co/Pt and Co/Pd interfaces in the stripe patterns is expected to be poorer than that in conventional [Co/Pt] and [Co/Pd] multilayers, which are formed during deposition. Because the interface anisotropy is sensitive to the smoothness of the interface 4 5 6 7 , the anisotropy formed in the Co/Pt and Co/Pd stripe patterns is expected to be small. In spite of this, the formation of interface anisotropy in Co/Pt and Co/Pd stripe patterns can be of significant importance, because magnetic anisotropy can be formed using lithography.…”
mentioning
confidence: 99%