2002
DOI: 10.1116/1.1517257
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Observation of step-flow growth in femtosecond pulsed laser deposition of Si on Si(100)-2×1

Abstract: Step-flow growth mode is observed for 100 fs pulsed laser deposition (fsPLD) of Si on vicinal Si(100)-2×1, while the Volmer–Weber mode is observed for fsPLD of Si on Si(100)-1×1. Reflection high-energy electron diffraction (RHEED) is used to in situ monitor the dynamics of the film growth while ex situ atomic force microscopy (AFM) is used to observe the morphology of the grown film. For Si on Si(100)-2×1, the diffraction pattern’s basic features remain unchanged during deposition, indicating step-flow growth.… Show more

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Cited by 12 publications
(5 citation statements)
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“…Similar results were observed for the Si homoepitaxy at low temperatures. 32 For deposition at 400°C, the formation of elongated hut clusters was observed as shown in Fig. 8͑b͒.…”
Section: B Effect Of Laser Fluencementioning
confidence: 86%
See 1 more Smart Citation
“…Similar results were observed for the Si homoepitaxy at low temperatures. 32 For deposition at 400°C, the formation of elongated hut clusters was observed as shown in Fig. 8͑b͒.…”
Section: B Effect Of Laser Fluencementioning
confidence: 86%
“…The Si͑100͒ samples are first cleaned by chemical etching using a modification to the Shiraki method. 32 The samples are dipped into a solution of H 2 SO 4 ͑97 wt % ͒ :H 2 O 2 ͑30 wt % ͒ =4:1 ͑by volume͒ for 10 min, rinsed with ultrapure water for 10 min, then dipped into a solution of HF ͑50 wt % ͒ :H 2 O=1:10 ͑by volume͒ for 1 min. The samples are loaded into the vacuum chamber within 5 min of chemical cleaning.…”
Section: Methodsmentioning
confidence: 99%
“…1. Si substrates are chemically cleaned prior being loading into the vacuum chamber [9]. The chamber is pumped down to a pressure of <1×10 -8 Torr and baked for 12-24 hours before flashing the substrate to ~1100 ºC in order for the 2×1 reconstruction to develop.…”
Section: Photodetector Fabricationmentioning
confidence: 99%
“…PLD produces energetic species, which results in the increase of the sticking coefficients and adatom surface mobility, enhancing epitaxy [2]. Epitaxial thin films of InP on GaAs(100) and Si on Si(100) were obtained using PLD [3,4]. Using femtosecond (fs) laser minimizes or eliminates particulates formation, which improves the grown thin film quality.…”
Section: Introductionmentioning
confidence: 99%