“…The am-Al 2 O 3 films formed on Al(111) and Al(100) can be described as constituted of neighboring "building blocks" of edge-and corner-sharing [AlO 4 ], [AlO 5 ], and [AlO 6 ] polyhedra (with the Al cations in, respectively, tetrahedral, pentagonal, and octahedral interstices of the distorted, densely packed oxygen sublattice), [39][40][41] where the free volume is associated with vacancy-type defects. 42 Although the oxide films on Al(111) and Al(100) are both amorphous according to the HRTEM analysis, local chemical state analysis by XPS revealed strikingly different microstructural developments for the evolving oxide films on the two Al surfaces. 16 On Al(100), the electronic polarizabilities around the core-ionized Al and O ions remain practically constant with increasing thickness, which evidences that the local chemical environments of the constituent Al and O ions is practically constant during growth.…”