Obtaining useful properties of different materials by using magnetron sputtering

Atomic spectrometry update: review of advances in atomic spectrometry and related techniques

“…Results of IR and MS analyses of exhaust gases showed that they contained 10% of unreacted SiF 4 and ∼5% of various uorosilanes. Langmuir probe measurements were also made by Senturk et al 84 in an argon DC plasma used for magnetron sputtering, operated at between 9 and 60 mTorr and from 300 to 500 V. The n e decreased and T e increased from 5.5 to 11 eV with increasing pressure.…”