2020
DOI: 10.1088/1361-6528/ab8cf4
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Ohmic contact engineering in few–layer black phosphorus: approaching the quantum limit

Abstract: Achieving good quality Ohmic contacts to van der Waals materials is a challenge, since at the interface between metal and van der Waals material, different conditions can occur, ranging from the presence of a large energy barrier between the two materials to the metallization of the layered material below the contacts. In black phosphorus (bP), a further challenge is its high reactivity to oxygen and moisture, since the presence of uncontrolled oxidation can substantially change the behavior of the contacts. I… Show more

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Cited by 25 publications
(27 citation statements)
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“…By extrapolating the results for wide nanoribbons to large-area 2D material devices, our results indicate that micro-scale phosphorene devices should have a significantly higher R C than graphene devices. This finding agrees with the literature that reports the best R C of 400 Ω µm [21] to 310 Ω µm [22] for phosphorene FETs, whereas the best reported R C for graphene FETs is ~80 Ω µm [35]. On the other hand, R C is very low in narrowest PNRs which means that patterning phosphorene into nanoribbons offers a promising avenue for R C minimization in ultra-scaled devices that enable high-density integration.…”
Section: Resultssupporting
confidence: 91%
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“…By extrapolating the results for wide nanoribbons to large-area 2D material devices, our results indicate that micro-scale phosphorene devices should have a significantly higher R C than graphene devices. This finding agrees with the literature that reports the best R C of 400 Ω µm [21] to 310 Ω µm [22] for phosphorene FETs, whereas the best reported R C for graphene FETs is ~80 Ω µm [35]. On the other hand, R C is very low in narrowest PNRs which means that patterning phosphorene into nanoribbons offers a promising avenue for R C minimization in ultra-scaled devices that enable high-density integration.…”
Section: Resultssupporting
confidence: 91%
“…While 2D materials and their nanostructures seem promising for nanodevices, they suffer from high contact resistance (R C ), which limits their performance and conceals their exceptional transport properties. For micro-scale BP FETs, R C was measured in the range from ≈1750 Ω µm [19] and ≈1100 Ω µm [9], over ≈700 Ω µm [20], down to ≈400 Ω µm [21] and 310 Ω µm [22]. Even the best reported R C values are unacceptably high for transistors in future high-density integrated circuits and, additionally, very little is known about R C levels and its behavior in PNR-based devices [23].…”
Section: Introductionmentioning
confidence: 99%
“…Finally, we inspect the behavior of the junction at elevated bias, to look for any subharmonic gap features. V bg = 0 V. Also in the n-type regime, as shown in the Supplementary Information, the quality of the contacts does not improve, consistent with previous observations, 59 and the metal-semiconductor contacts are still dominated by the Schottky barrier, which prevents observation of a bipolar signal in supercurrent amplitude. Thus, in the following we will focus on the accumulation region.…”
supporting
confidence: 86%
“…[ 40 , 41 ]. Moreover, we neglect contact resistance in this study although it is a severe performance limiter in all 2D material-based FETs [ 42 , 43 ], including monolayer BP [ 4 , 44 , 45 ] and nanoribbon-based FET structures [ 22 , 33 , 46 , 47 ]. Nevertheless, our work illustrated the importance of using a proper Hamiltonian in the simulation of PNR nanodevices, quantified the magnitude of size-scaling and bandstructure effects, and demonstrated a considerable improvement of PNR FET figures-of-merit in comparison to the simpler TBL model.…”
Section: Discussionmentioning
confidence: 99%