On-axis sputtering fabrication of Tm3Fe5O12 film with perpendicular magnetic anisotropy

Large-scale fabrication of thulium iron garnet film with perpendicular magnetic anisotropy using RF magnetron sputtering

“…The result obtained that the RMS roughness is 0.8 nm, which is close to other reports. 1,25,31) To corroborate our method at a lower thickness, we fabricated 10 nm TmIG films with the same parameter growth at 20 nm. XRD and SQUID MPMS3 were performed to confirm the crystal structure and PMA properties, respectively.…”

“…3(a) and 3(b)] with a Tm/Fe ratio of 0.65, close to TmIG bulk and previous report. 23,25) XRD measurements were performed to confirm the crystal structure of TmIG film with different post-annealing temperatures, as shown in Fig. 4.…”

“…This is 600% larger than the previous results. 23,25) The deposition was carried out at a total pressure of 1 Pa, substrate rotation speed of 10 rpm, deposition rate of 0.5 nm min −1 , and an RF power set to 60 W with 5 W increments every 5 min. Ar and O 2 were supplied at 18 sccm and 5 sccm.…”

“…6,23) By contrast, the number of studies on the onaxis sputtering, suitable for industrial-scale fabrication 24) is still limited. In the previous study, the PMA films were obtained by tuning the thickness and the Tm/Fe ratio, 25) which depend on the position of the substrate relative to the target (Fig. 1).…”