2019
DOI: 10.1021/acsphotonics.9b00451
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On-Demand Generation of Single Silicon Vacancy Defects in Silicon Carbide

Abstract: Defects in silicon carbide have been explored as promising spin systems in quantum technologies. However, for practical quantum metrology and quantum communication, it is critical to achieve the on-demand shallow spin-defect generation. In this work, we present the generation and characterization of shallow silicon vacancies in silicon carbide by using different implanted ions and annealing conditions. The conversion efficiency of silicon vacancy of helium ions is shown to be higher than that by carbon and hyd… Show more

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Cited by 78 publications
(71 citation statements)
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References 55 publications
(277 reference statements)
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“…The culet diameter is 200 µm and the crystalline orientation with the 1000 (c-axis). 20 keV helium ions (He + ) with a dose of 1× 10 13 /cm 2 are perpendicularly implanted to the culets to generate high-density shallow V Si defects and the corresponding depth is around 100 nm through the stopping and range of ions in matter (SRIM) simulation 30 . We then anneal the SiC anvil cells at 500 ℃ for 2 hours to further increase the V Si defects density by around 3 times 30 .…”
Section: Methodsmentioning
confidence: 99%
“…The culet diameter is 200 µm and the crystalline orientation with the 1000 (c-axis). 20 keV helium ions (He + ) with a dose of 1× 10 13 /cm 2 are perpendicularly implanted to the culets to generate high-density shallow V Si defects and the corresponding depth is around 100 nm through the stopping and range of ions in matter (SRIM) simulation 30 . We then anneal the SiC anvil cells at 500 ℃ for 2 hours to further increase the V Si defects density by around 3 times 30 .…”
Section: Methodsmentioning
confidence: 99%
“…Different ions were used in [116] to implant an array of ensemble and single V Si in intrinsic pure commercial 4H SiC. Shallow V Si defects (less than 200 nm below surface) were created by implanting hydrogen (H 2 + ), helium (He + ), and (less than 60 nm below surface) carbon (C + ) with energy 40 keV for H 2 + , 20 keV for He + and C + with the fluences ranging from 1×10 11 cm −2 to 1×10 14 cm −2 , respectively.…”
Section: Defects Fabrication: Materials Growth and Irradiationmentioning
confidence: 99%
“…[ 37,53 ] In particular, 6 H ‐SiC and 4 H ‐SiC, the most commonly studied SiC polytopes, exhibit near‐infrared emission that minimizes absorbance from optical fibers, facilitating integration into optical devices for sensing applications. [ 53,130 ] Consequently, SiC‐based quantum sensors have been explored for measuring magnetic fields, [ 131,132 ] temperature (10–310 K), [ 133 ] strain, [ 134 ] and electric fields, [ 57,58 ] among others. The silicon monovacancy ( V si − ) and divacancy ( V si , with missing adjacent Si and C atoms) are the two most well‐studied SiC centers for quantum applications.…”
Section: Quantum Sensingmentioning
confidence: 99%
“…SiC is quickly emerging as a versatile material for quantum sensing applications, with advantageous properties including optical fiber‐relevant emission wavelengths, processability, and the ability to operate at room temperature in ambient conditions. Research focused on integrating SiC color centers into devices, [ 125,141 ] improved material processing, [ 129,132 ] and the discovery of new optically active vacancy centers [ 106,142 ] should further expand the utility of SiC centers in energy‐based sensing applications. Rare earth ion‐doped solids …”
Section: Quantum Sensingmentioning
confidence: 99%