2023
DOI: 10.1063/5.0134006
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On power and fundamental resistance relations in symmetric RF CCPs by simulating simplified nonlinear circuits

Abstract: Voltage and current measured from radio frequency (RF) capacitively coupled plasmas (CCPs) are basic data, from which various powers and impedances are subsequently calculated via fast Fourier transform to gain deep insight into RF CCPs. The specific values of these parameters depend on the nonlinearity of RF CCPs and the interaction with the external circuit, but the relation between harmonic powers and that among the fundamental resistances are not known. These questions are investigated via Multisim softwar… Show more

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“…The electrical power (f 1 − f 3 ) flows from the rf power supply to the CCP, where it is decomposed into basic harmonics (f 1 − f 3 ) and higher harmonics (f 4 − f 15 ) inside the CCP, and then the higher harmonic power (f 4 − f 15 ) flows back from the CCP to the rf power supply, which explains why both I rf and I CCP in figure 5(d) have high-order harmonics. This phenomenon has also been revealed in previous experiments [68] and simulations [69]. The I CCP in figure 5(d) still has a significant amplitude at relatively high harmonic frequencies.…”
Section: Results and Analysissupporting
confidence: 86%
“…The electrical power (f 1 − f 3 ) flows from the rf power supply to the CCP, where it is decomposed into basic harmonics (f 1 − f 3 ) and higher harmonics (f 4 − f 15 ) inside the CCP, and then the higher harmonic power (f 4 − f 15 ) flows back from the CCP to the rf power supply, which explains why both I rf and I CCP in figure 5(d) have high-order harmonics. This phenomenon has also been revealed in previous experiments [68] and simulations [69]. The I CCP in figure 5(d) still has a significant amplitude at relatively high harmonic frequencies.…”
Section: Results and Analysissupporting
confidence: 86%