1993
DOI: 10.1016/0022-3093(93)91133-n
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On the determination of the interface density of states in aSi:H/aSi1−XCX:H multilayers

Abstract: This paper deals with the determination of the interface density of states in amorphous silicon-based

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“…The growth of a-Si:H layers on top them partially fills these growing microvoids, giving nonabrupt interfaces, but also a low density of dangling bonds [12] and a higher density of the 1-xx a -Si C :H layers as a result.…”
Section: Resultsmentioning
confidence: 99%
“…The growth of a-Si:H layers on top them partially fills these growing microvoids, giving nonabrupt interfaces, but also a low density of dangling bonds [12] and a higher density of the 1-xx a -Si C :H layers as a result.…”
Section: Resultsmentioning
confidence: 99%