2001
DOI: 10.1016/s0921-5093(00)01031-5
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On the ductile machining of silicon for micro electro-mechanical systems (MEMS), opto-electronic and optical applications

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Cited by 159 publications
(69 citation statements)
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“…It was found surface roughness obtained in DMC of silicon was much better than that generated from the grinding [55]. Very smooth surfaces and continuous chips can be achieved in DMC of silicon using an external high hydrostatic pressure of 400 MPa with a diamond tool having an edge radius at nanometer scale [21]. A surface roughness value of below 10 nm was obtained in DMC of silicon wafers as shown in Fig.…”
Section: Surface Finishmentioning
confidence: 86%
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“…It was found surface roughness obtained in DMC of silicon was much better than that generated from the grinding [55]. Very smooth surfaces and continuous chips can be achieved in DMC of silicon using an external high hydrostatic pressure of 400 MPa with a diamond tool having an edge radius at nanometer scale [21]. A surface roughness value of below 10 nm was obtained in DMC of silicon wafers as shown in Fig.…”
Section: Surface Finishmentioning
confidence: 86%
“…A customized stage having an external hydrostatic pressure attachment was used to cut silicon at the nanometric scale with diamond tools [21]. Very smooth surfaces and continuous chips, i.e., DMC, were achieved with an UCT of 50 nm, which is larger than the critical UCT of 40 nm [45] (both studies of Refs.…”
Section: Discussionmentioning
confidence: 99%
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