On the Electronic Properties of Silicon-Tellurium Films

Abstract

Silicon and Silicon-Tellurium films were prepared in an ultrahigh vacuum system. The d.c. electrical conductivity of these films were measured under vacuum before exposing them to the air. The thermal activation energies of Silicon-Tellurium films were always found to be greater than that of Silicon films. Furthermore the optical measurements on Silicon-Tellurium films indicated that the optical gap of these films decreases as the concentration of tellurium in the films increases. Electron microscope examinations revealed that the films were amorphous in structure and homogeneous in composition.