On the formation of nonequilibrium A15 crystal structure chromium thin films by sputter deposition

Chu, Jinn P.; Chang, Jeng-Shou; Lee, P.Y.; Wu, Jen Leih; Wang, J.Y.

doi:10.1016/s0040-6090(97)00593-2

Cited by 15 publications

(4 citation statements)

References 29 publications

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“…However, the sample deposited with two-step rotation shows only cubic A15 phase. It has been shown that Cr films deposited with normal incidence by sputter deposition tend to undergo a phase transformation from the cubic A15 phase to the BCC phase with increasing film thickness [23]. The presence of a minor BCC phase in the W sample deposited with no rotation could be the initialization of α-phase formation due to increasing thickness.…”

Section: Crystal Structure and Texture Analysismentioning

confidence: 99%

The formation of vertically aligned biaxial tungsten nanorods using a novel shadowing growth technique

Krishnan

Parker

S³

et al. 2009

Nanotechnology

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Biaxially textured tungsten nanorods (A15 crystal structure) have been grown by oblique angle DC magnetron sputtering using a novel rotation mode called 'two-step rotation'. In this mode, the substrate is given a fast rotation through 180 degrees at 90 rpm and this is followed by a rest period of 30 s. These nanorods are vertically aligned and have a [100] texture normal to the substrate along with preferential in-plane texture as shown by x-ray pole figure analysis. In contrast, the tungsten nanorods obtained without substrate rotation are slanted at an angle of approximately 45 degrees and have a [100] texture tilted 16 degrees with respect to the substrate normal. The flux is incident from two diametrically opposite points on the sample at an oblique angle, averaging out the growth into vertical columns that retain the in-plane texture. Scanning electron microscopy shows that the tungsten nanorods have a mixture of {211} and {421} crystal habits; these planes are both minimum surface energy planes for a cubic A15 crystal structure.

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Section: Crystal Structure and Texture Analysismentioning

confidence: 99%

The formation of vertically aligned biaxial tungsten nanorods using a novel shadowing growth technique

Krishnan

Parker

S³

et al. 2009

Nanotechnology

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“…The α-Cr phase manifests the body-centered cubic structure commonly found in Cr metal. The δ-Cr phase with the A-15 type primitive cubic structure is less common but has previously been detected in a deposit obtained from evaporating Cr metal in Ar gas at low pressures or under vacuum. − The δ-Cr phase has also been attained after annealing electrodeposition products from a CrCl 3 methanol solution or as deposits from aqueous CrCl 3 solutions containing LiCl. , In the present case, agitated electrolysis at 5, 10, and 20 mA cm –2 yields α-Cr (2θ = 44.4°, 64.6°, and 81.7°); whereas δ-Cr (2θ = 39.6°, 44.5°, 49.0°, 71.8°, 75.2°, and 78.6°) appears in deposits obtained above 20 mA cm –2 (both are α- and δ-phases are deposited at 20 mA cm –2 ). On the other hand, electrolysis performed without applied agitation produces δ-Cr as the main deposit (α-Cr is obtained only at 5 mA cm –2 ).…”

Section: Resultsmentioning

confidence: 54%

Concentrated Aqueous Solution of Chromium Dichloride for Chromium Metal Electrodeposition

et al. 2022

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Concentrated electrolytes have been found to play host to stellar phenomena previously unachievable in solutions at diluted or moderate concentrations. In an attempt to explore the possible utility of concentrated electrolytes in electroplating, this study reports the electrodeposition of Cr metal using a concentrated aqueous solution of Cr(II) (4.0 mol kg–1) without additives. Target aqueous CrCl2 solutions are characterized by UV–visible spectroscopic and ionic conductivity measurements. The influence of concentration, current density, and agitation on Cr metal deposition is discussed on the basis of cyclic voltammetry, galvanostatic electrolysis, X-ray diffraction, and scanning electron microscopy. Here, electrolysis of the concentrated electrolyte at medium current densities (20 mA cm–2) under agitation is found to engender dense metallic α-Cr deposits with high adhesivity to the substrate. The results further show that increasing the current density to expedite the deposition process promotes the involvement of an impurity phase and deposition of the δ-Cr phase.

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“…Similar results reported on metastable Cr films revealed that the heat due to sputtering caused a temperature rise in the film and the film underwent a phase transformation that normally took place at low temperatures. 17,18) Although crystalline structure exists for films deposited at above 450 C, the dielectric constant still remains small. Noh et al 7) observed the variation of dielectric constant with BST crystallized layer thickness.…”

Section: Discussionmentioning

confidence: 99%

Microstructure and Dielectric Properties of Sputtered (Ba_0.3Sr_0.7)TiO₃ Thin Films with Amorphous Interfacial Layers

Lin¹,

Chu²,

Wang

et al. 2005

Jpn. J. Appl. Phys.

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Crystallization behavior, microstructure and dielectric properties of sputtered (Ba0.3Sr0.7)TiO3 thin films have been studied. The crystallization from as-deposited amorphous structure to equilibrium crystalline structure is confirmed as an irreversible, exothermic and first-order transition by differential scanning calorimetry. At a heating rate of 20°C/min, the exothermic peak temperature for crystallization is measured to be 697.3°C. Transmission electron microscopy results reveal layered structures of amorphous and perovskite crystalline phases in the films deposited at temperatures between 450 and 650°C. The amorphous interfacial layer diminishes with increasing substrate temperature and a well-crystallized film is found at 750°C with a dielectric loss of 0.021. Dielectric constant shows an abrupt increase to 187 for the film deposited at 750°C as a result of the fully crystallized structure. The measured dielectric constants at different temperatures are well consistent with those calculated based on the presence of amorphous interfacial layers in the films.

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On the formation of nonequilibrium A15 crystal structure chromium thin films by sputter deposition

Cited by 15 publications

References 29 publications

The formation of vertically aligned biaxial tungsten nanorods using a novel shadowing growth technique

The formation of vertically aligned biaxial tungsten nanorods using a novel shadowing growth technique

Concentrated Aqueous Solution of Chromium Dichloride for Chromium Metal Electrodeposition

Microstructure and Dielectric Properties of Sputtered (Ba_0.3Sr_0.7)TiO₃ Thin Films with Amorphous Interfacial Layers

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On the formation of nonequilibrium A15 crystal structure chromium thin films by sputter deposition

Cited by 15 publications

References 29 publications

The formation of vertically aligned biaxial tungsten nanorods using a novel shadowing growth technique

The formation of vertically aligned biaxial tungsten nanorods using a novel shadowing growth technique

Concentrated Aqueous Solution of Chromium Dichloride for Chromium Metal Electrodeposition

Microstructure and Dielectric Properties of Sputtered (Ba0.3Sr0.7)TiO3 Thin Films with Amorphous Interfacial Layers

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Product

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Microstructure and Dielectric Properties of Sputtered (Ba_0.3Sr_0.7)TiO₃ Thin Films with Amorphous Interfacial Layers