2021
DOI: 10.1016/j.actamat.2021.116896
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On the grain size-thickness correlation for thin films

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Cited by 48 publications
(24 citation statements)
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“…The grain size was determined by transmission electron microscopy. As discussed by Dulmaa et al [ 18 ], a good agreement between the grain size measured with TEM and the domain size measured with XRD is found for small grains. The data of Tang et al are in the same range as our value.…”
Section: Resultssupporting
confidence: 76%
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“…The grain size was determined by transmission electron microscopy. As discussed by Dulmaa et al [ 18 ], a good agreement between the grain size measured with TEM and the domain size measured with XRD is found for small grains. The data of Tang et al are in the same range as our value.…”
Section: Resultssupporting
confidence: 76%
“…As discussed in [ 18 , 19 ], the influence of the embedded impurities on the microstrain is negligible. Hence, based on curve-fitting of the same peak using a Lorentzian profile, the FWHM was determined and the domain size was calculated using the Scherrer equation.…”
Section: Resultsmentioning
confidence: 99%
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“…The microstructure, mechanical and tribological behavior are strongly related to N 2 /Ar flow ratios during deposition. Different nitrogen contents cause changes in the crystal lattices and width of the constituent columns growing perpendicular to the substrate [ 22 , 23 ]. CrN coatings exhibit interesting electrical and magnetic properties due to semiconductor behavior and magnetic ordering, thus becoming a promising coating in magnetic semiconductor thinner applications [ 6 , 22 , 24 , 25 , 26 ].…”
Section: Introductionmentioning
confidence: 99%
“…This can be understood from realizing that the grain density ρ increases monotonically as n r /g r increases and that, at film closure, the characteristic length of grains and the film thickness decrease monotonically as ρ increases. In general, the characteristic length after film closure is correlated with the thickness of the film depending on the dominant growth and restructuring mechanisms [20,21]. A prime example of process for which n r /g r is too small to form films in the submicron scale is provided by the chemical vapor deposition of polycrystalline diamond (PCD) [22][23][24][25].…”
Section: Introductionmentioning
confidence: 99%