2022
DOI: 10.1063/5.0096316
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On the Ohmic-dominant heating mode of capacitively coupled plasma inverted by boundary electron emission

Abstract: Electron emission from the boundary is ubiquitous in a capacitively coupled plasma (CCP) and precipitates nonnegligible influence on the discharge properties. Here, we present Particle-in-Cell/Monte Carlo Collision simulation of an Ohmic-dominant heating mode of the capacitively coupled plasma, where the stochastic heating vanishes and only Ohmic heating sustains the discharge due to sheath inversion by boundary electron emission. The inverted CCP features negative sheath potential without Bohm presheath, henc… Show more

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Cited by 5 publications
(4 citation statements)
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“…It should be noted that the previous probe measurements of the ion-ion plasma formed in front of the PG surface of a negative ion source suggested a positive plasma potential relative to the PG, instead of the negative plasma potential as predicted by the inverse sheath theory. This paradox could be solved by a recent comparison of the same inverse sheath formation in front of the emissive surface using different treatments of electron-neutral collision [25,26]. With realistic ionizations, positive ions generated in bulk plasma are trapped and accumulate, forming a potential 'hill' in bulk plasma, which leads to a non-flat presheath coupled with the inverse sheath and a positive plasma potential relative to the surface.…”
Section: Experimental Supportmentioning
confidence: 99%
See 1 more Smart Citation
“…It should be noted that the previous probe measurements of the ion-ion plasma formed in front of the PG surface of a negative ion source suggested a positive plasma potential relative to the PG, instead of the negative plasma potential as predicted by the inverse sheath theory. This paradox could be solved by a recent comparison of the same inverse sheath formation in front of the emissive surface using different treatments of electron-neutral collision [25,26]. With realistic ionizations, positive ions generated in bulk plasma are trapped and accumulate, forming a potential 'hill' in bulk plasma, which leads to a non-flat presheath coupled with the inverse sheath and a positive plasma potential relative to the surface.…”
Section: Experimental Supportmentioning
confidence: 99%
“…Potential distribution between the potential minimum of the VC and the plasma is the same as in a classic Debye sheath coupled with a Bohm presheath. Recent theories and experiments questioned the stability of the SCL sheath if the sheath is collisional: positive ion charge-exchange collision in the VC should create cold ions that are trapped by local potential dip and gradually fill up the VC [23][24][25][26]. This eventually yields the so-called inverse sheath, where the wall potential floats above the plasma potential and the presheath potential profile is flat.…”
Section: Introductionmentioning
confidence: 99%
“…PIC model where self-consistent plasma-neutral collisions are implemented. A comparison of the kinetic simulation and PIC simulation was recently performed for the capacitively-coupled plasma subject to strong electron emission from the boundary (13,35), where discrepancies are more obvious at high neutral pressure levels as the kinetic model does not implement realistic electron-neutral collisions and ionization sources. Similar comparison between kinetic and PIC model of the SEE coefficient charging effect are expected for DC or RF plasma conditions.…”
Section: Implementation Of Electron Backscattering In Simulationmentioning
confidence: 99%
“…As has been pointed out in Implementation of electron backscattering in simulation, the use of artificial collision operator, though providing good agreement with the emissive sheath theory, can conceal certain physics that are only available in, for example, the PIC model where self-consistent plasmaneutral collisions are implemented. A comparison of the kinetic simulation and PIC simulation was recently performed for the capacitively coupled plasma subject to strong electron emission from the boundary [13,35], where discrepancies are more…”
Section: Implementation Of Electron Backscattering In Simulationmentioning
confidence: 99%