Cryogenic field-effect transistors (FETs) offer great
potential
for applications, the most notable example being classical control
electronics for quantum information processors. For the latter, on-chip
FETs with low power consumption are crucial. This requires operating
voltages in the millivolt range, which are only achievable in devices
with ultrasteep subthreshold slopes. However, in conventional cryogenic
metal-oxide-semiconductor (MOS)FETs based on bulk material, the experimentally
achieved inverse subthreshold slopes saturate around a few mV/dec
due to disorder and charged defects at the MOS interface. FETs based
on two-dimensional materials offer a promising alternative. Here,
we show that FETs based on Bernal stacked bilayer graphene encapsulated
in hexagonal boron nitride and graphite gates exhibit inverse subthreshold
slopes of down to 250 μV/dec at 0.1 K, approaching the Boltzmann
limit. This result indicates an effective suppression of band tailing
in van der Waals heterostructures without bulk interfaces, leading
to superior device performance at cryogenic temperature.