On the phase formation of titanium oxide thin films deposited by reactive DC magnetron sputtering: influence of oxygen partial pressure and nitrogen doping

Influence of crystallization conditions and of gaseous ammonia treatment on mesoporous TiO2 properties

“…This difference of crystallinity degree can be attributed to the lower content of oxygen in synthetic air. In fact, the formation and the growth of anatase particles are not favored at low oxygen content [57,58]. However, the shift of the Eg mode from 150 to 148 cm -1 (Fig.…”

“…2Bc). The absence of oxygen during the crystallization, is a drawback for the growth of anatase particles [57,58]. XRD pattern (Fig.…”

Effect of substrate temperature and annealing on the growth of TiO2‐x thin films deposited by using DC‐magnetron sputtering technique

“…12 The as-deposited titanium oxide film exhibits amorphous and mixed anatase/rutile phases before post-deposition annealing. 13,14 A higher annealing temperature is usually required to achieve single-phase rutile. 15 It also depends on the plasma parameters (such as particle densities, discharge current, electron and ion energy distributions and deposition rate), target-substrate distance, substrate temperature (ST), reaction atmosphere and the geometrical configuration of the system.…”

“…Generally, anatase and brookite phases are thermodynamically metastable, while rutile is stable 12 . The as‐deposited titanium oxide film exhibits amorphous and mixed anatase/rutile phases before post‐deposition annealing 13,14 . A higher annealing temperature is usually required to achieve single‐phase rutile 15 .…”

Structural Changes of Titanium Dioxide Thin Films Deposited by Reactive Magnetron Sputtering through Nitrogen Incorporation

“…The structure change can be attained by doping with non-metal impurities. Most of the experimental efforts have focused on the nitrogen incorporation and determination of its location into the film crystal structure [1,[9][10][11][12][13].…”