On the problem of electron-emission mechanisms in the cathode spot of a vacuum arc discharge

Arustamov, V. N.; Ashurov, Kh. B.; Kadirov, Kh. Kh.; Khudaykulov, I. Kh.

doi:10.1134/s1027451013040289

Cited by 3 publications

(1 citation statement)

References 4 publications

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“…The electric field near the cathode's surface is created by ionic current. The interrelation between electric field strength, ion current density, and other parameters of the spot is determined by MacKeown's equation [7], which is reduced to a form that is simpler and more convenient for calculations [8]:…”

Section: Cathode Spot Parametersmentioning

confidence: 99%

Structure and parameters of vacuum arc cathode spots

Arustamov

Ashurov

Kadirov

et al. 2014

Bull. Russ. Acad. Sci. Phys.

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The effect of such parameters of cathode materials as the heat of atom evaporation, atomic weight, work function of electrons on the structure of cathode spots of a vacuum arc, conditions of charged particle generation, and, most important, the F emission of electrons, is considered. Determining the interrelation of cathode parameters and processes in a vacuum arc cathode spot helps develop conditions for a vacuum arc to effectively modify the surfaces of materials.

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Section: Cathode Spot Parametersmentioning

confidence: 99%

Structure and parameters of vacuum arc cathode spots

Arustamov

Ashurov

Kadirov

et al. 2014

Bull. Russ. Acad. Sci. Phys.

Self Cite

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Arc erosion resistance of CuCrMo films deposited via magnetron sputtering

Miao

Qian

et al. 2021

Mater. Res. Express

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Copper-chromium (CuCr) alloys are widely used as electrical contact materials, and their arc erosion resistance can be improved by reducing the sizes of the Cu and Cr phases or by adding Mo. In this study, supersaturation solid solutions of CuCr and CuCrMo films were prepared via magnetron sputtering. After annealing at 773 K, the CuCr and CuCrMo films are composed of a small Cu-rich face-centred cubic phase and a Cr-rich body-centred cubic phase. Meanwhile, the addition of Mo reduces the diffusion rate during annealing. The lattice distortion of the CuCrMo thin film exceeds that of the CuCr film, and the elastic modulus and hardness increase. Compared with those of the CuCr film, the erosion area of the CuCrMo film is larger, and the depth of the erosion pit is lower. The arc erosion experiment proved that CuCrMo films exhibit satisfactory arc erosion resistance.

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